Ms. Ayako Endo Profile

Ayako Endo

at Toshiba Corp

SPIE Involvement:

Author

Publications (8)

SPIE Journal Paper | 1 October 2006

Impact of polarization on an attenuated phase shift mask with ArF hyper-numerical aperture lithography

Takashi Sato, Ayako Endo, Akiko Mimotogi, Shoji Mimotogi, Kazuya Sato, Satoshi Tanaka

JM3, Vol. 5, Issue 04, 043001, (October 2006) https://doi.org/10.1117/12.10.1117/1.2397065

KEYWORDS: Polarization, Photomasks, Transmittance, Chromium, Phase shifts, Lithography, Lithographic illumination, Immersion lithography, Semiconducting wafers, Finite-difference time-domain method

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Proceedings Article | 12 May 2005 Paper

Impact of polarization for an attenuated phase-shift mask with ArF hyper-NA lithography

Takashi Sato, Ayako Endo, Akiko Mimotogi, Shoji Mimotogi, Kazuya Sato, Satoshi Tanaka

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598458

KEYWORDS: Polarization, Photomasks, Phase shifts, Chromium, Lithography, Lithographic illumination, Semiconducting wafers, Electroluminescence, Transmittance, Tolerancing

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SPIE Journal Paper | 1 April 2005

Alignment mark signal simulation system for the optimum mark feature selection

Takashi Sato, Ayako Endo, Tatsuhiko Higashiki, Kazutaka Ishigo, Takuya Kono, Takashi Sakamoto, Yoshiyuki Shioyama, Satoshi Tanaka

JM3, Vol. 4, Issue 02, 023002, (April 2005) https://doi.org/10.1117/12.10.1117/1.1898603

KEYWORDS: Inspection, Chemical mechanical planarization, Laser ablation, Computer aided design, Metals, Photomasks, TCAD, Optical alignment, Semiconducting wafers, Signal processing

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SPIE Journal Paper | 1 July 2004

Resist footing variation and compensation over nonplanar wafer

Takashi Sato, Ayako Endo, Koji Hashimoto, Soichi Inoue, Tsuyoshi Shibata, Yuuji Kobayashi

JM3, Vol. 3, Issue 03, (July 2004) https://doi.org/10.1117/12.10.1117/1.1759327

KEYWORDS: Scanners, Deep ultraviolet, Light sources, Finite-difference time-domain method, Computer simulations, Lithography, Wafer-level optics, Diffraction, Ion implantation, Semiconducting wafers

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Proceedings Article | 28 May 2004 Paper

Approach for reducing resist footing over nonplanar wafer

Ayako Endo, Takashi Sato, Masafumi Asano, Shoji Mimotogi, Soichi Inoue

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536108

KEYWORDS: Photomasks, Semiconducting wafers, Diffraction, Binary data, Diffractive optical elements, Ions, Lithography, Photoresist processing, Chemical mechanical planarization, Optical lithography

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Proceedings Article | 24 May 2004 Paper

Alignment mark signal simulation system for the optimum mark feature selection

Takashi Sato, Ayako Endo, Tatsuhiko Higashiki, Kazutaka Ishigo, Takuya Kono, Takashi Sakamoto, Yoshiyuki Shioyama, Satoshi Tanaka

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.532808

KEYWORDS: Signal processing, Optical alignment, TCAD, Semiconducting wafers, Photomasks, Computer aided design, Metals, Optical simulations, Inspection, Chemical mechanical planarization

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Proceedings Article | 26 June 2003 Paper

Resist footing variation and compensation over nonplanar wafer

Takashi Sato, Ayako Endo, Kohji Hashimoto, Soichi Inoue, Tsuyoshi Shibata, Yuuji Kobayashi

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485463

KEYWORDS: Semiconducting wafers, Ion implantation, Diffraction, Wafer-level optics, Lithography, Computer simulations, Deep ultraviolet, Light sources, Geometrical optics, Scanners

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Proceedings Article | 26 June 2003 Paper

Rigorous simulation of exposure over nonplanar wafers

Andreas Erdmann, Christian Kalus, Thomas Schmoeller, Yewgenija Klyonova, Takashi Sato, Ayako Endo, Tsuyoshi Shibata, Yuuji Kobayashi

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485390

KEYWORDS: Semiconducting wafers, Photomasks, Lithography, Diffraction, Photoresist materials, Computer simulations, Finite-difference time-domain method, Electromagnetism, Silicon, Reflectivity

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Showing 5 of 8 publications

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