Ayako Endo
at Toshiba Corp
SPIE Involvement:
Author
Publications (8)

SPIE Journal Paper | October 1, 2006
JM3 Vol. 5 Issue 04
KEYWORDS: Polarization, Photomasks, Transmittance, Chromium, Phase shifts, Lithography, Lithographic illumination, Immersion lithography, Semiconducting wafers, Finite-difference time-domain method

SPIE Journal Paper | April 1, 2005
JM3 Vol. 4 Issue 02
KEYWORDS: Signal processing, Semiconducting wafers, Optical alignment, TCAD, Photomasks, Metals, Computer aided design, Laser ablation, Chemical mechanical planarization, Inspection

SPIE Journal Paper | July 1, 2004
JM3 Vol. 3 Issue 03
KEYWORDS: Semiconducting wafers, Ion implantation, Diffraction, Wafer-level optics, Lithography, Computer simulations, Finite-difference time-domain method, Light sources, Deep ultraviolet, Scanners

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Diffraction, Optical lithography, Diffractive optical elements, Ions, Photomasks, Photoresist processing, Semiconducting wafers, Binary data, Chemical mechanical planarization

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Metals, Inspection, Signal processing, Photomasks, Optical simulations, Optical alignment, Computer aided design, Semiconducting wafers, TCAD, Chemical mechanical planarization

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Lithographic illumination, Polarization, Chromium, Electroluminescence, Transmittance, Photomasks, Semiconducting wafers, Tolerancing, Phase shifts

Showing 5 of 8 publications
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