Ms. Ayako Sukegawa
at Nikon Corp
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Reticles, Data modeling, Scanners, Error analysis, Distortion, Electroluminescence, Photomasks, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | April 5, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Reticles, Databases, Scanners, Error analysis, Control systems, Distortion, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 26, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Refractive index, Microfluidics, Polarization, Birefringence, Water, Lens design, Immersion lithography, Semiconducting wafers, Absorption

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Lithography, Data modeling, Control systems, Distortion, Data processing, Thermal effects, Semiconductor manufacturing, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | June 26, 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Statistical analysis, Particles, Distortion, Computer simulations, Optical alignment, Neodymium, Semiconducting wafers, Expectation maximization algorithms, Visibility

PROCEEDINGS ARTICLE | June 2, 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Microscopes, Monochromatic aberrations, Spatial frequencies, Reflectivity, Image analysis, Optical alignment, Neodymium, Semiconducting wafers, Phase shifts, Chemical mechanical planarization

Showing 5 of 6 publications
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