Dr. Ayman Hamouda
Senior OPC Engineer at
SPIE Involvement:
Author
Publications (16)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Optical lithography, Deep ultraviolet, Etching, Printing, Photomasks, Optical proximity correction, Mask making, Critical dimension metrology, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Optical lithography, Cadmium, Visualization, Databases, Design for manufacturing, Photomasks, Semiconductor manufacturing, Computational lithography, Optical proximity correction, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | October 25, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Electron beam lithography, Optical lithography, Data modeling, Etching, Manufacturing, Photomasks, Optical proximity correction, Semiconducting wafers, Yield improvement, Process modeling

PROCEEDINGS ARTICLE | March 16, 2016
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Lithography, Optical lithography, Calibration, Etching, Computer simulations, Bridges, Photomasks, Optical proximity correction, Semiconducting wafers, Yield improvement

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Scanners, Photomasks, Source mask optimization, Optical proximity correction, Semiconducting wafers, Process modeling

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Optical lithography, Data modeling, Calibration, Etching, Metals, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Model-based design, Process modeling

Showing 5 of 16 publications
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