Dr. Azalia Krasnoperova Profile

Dr. Azalia Krasnoperova

Senior Engineer at GLOBALFOUNDRIES Inc

SPIE Involvement:

Author

Publications (25)

Proceedings Article | 31 March 2014 Paper

Paper

Computational lithography platform for 193i-guided directed self-assembly

Rasit Topalogu, Moutaz Fakhry, Kafai Lai, Melih Ozlem, Anthony Schepis, Chi-chun Liu, Daniel Dechene, Jed Pitera, Neal Lafferty, Daniel Brue, Azalia Krasnoperova, Mike Guillorn, Hsinyu Tsai, Jassem Abdallah, Gregory Doerk, Joy Cheng, Melia Tjio

Proceedings Volume 9052, 90521A (2014) https://doi.org/10.1117/12.2046920

KEYWORDS: 3D modeling, Monte Carlo methods, Computational lithography, Photomasks, Critical dimension metrology, Lithography, Photoresist processing, Instrument modeling, Optical lithography, Directed self assembly

Read Abstract +

Proceedings Article | 16 March 2010 Paper

Paper

Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations

Jon Lee, Azalia Krasnoperova, Lei Zhuang, Daniel Corliss, Emily Gallagher, Kafai Lai, Michael Lam, Hidemasa Muta, Tadanobu Inoue, Laszlo Ladanyi, Tom Faure, Nick Cobb, Young Kim, Phil Strenski, Francisco Barahona, Alexander Tritchkov, Yuri Granik, Greg McIntyre, Jason Meiring, Aasutosh Dave, Jaione Tirapu-Azpiroz, Scott Halle, Kehan Tian, Andreas Waechter, Daniele Scarpazza, Alfred Wagner, Alan Rosenbluth, Moutaz Fakhry, Saeed Bagheri, Gabriel Berger, David Melville, Mike Hibbs, Geoffrey Burr, Kostas Adam, Masaharu Sakamoto

Proceedings Volume 7640, 764006 (2010) https://doi.org/10.1117/12.846716

KEYWORDS: Source mask optimization, Photomasks, Metals, Lithography, Optical proximity correction, Line edge roughness, Resolution enhancement technologies, Diffractive optical elements, Semiconducting wafers, Scanning electron microscopy

Read Abstract +

Proceedings Article | 4 March 2010 Paper

Paper

Automation of sample plan creation for process model calibration

Ramya Viswanathan, Azalia Krasnoperova, Mohamed Al-Imam, Amr Abdo, James Oberschmidt, Tamer Desouky

Proceedings Volume 7640, 76401G (2010) https://doi.org/10.1117/12.846276

KEYWORDS: Calibration, Process modeling, Statistical modeling, Data modeling, Photoresist processing, Lithography, Computer simulations, Image processing, Metrology, Optical proximity correction

Read Abstract +

Proceedings Article | 16 March 2009 Paper

Paper

Benefits and trade-offs of global source optimization in optical lithography

David Melville, Bradley Morgenfeld, Saeed Bagheri, Jaione Tirapu-Azpiroz, Kafai Lai, Dario Gil, Chia-chen Chen, Kehan Tian, Azalia Krasnoperova, Alan Rosenbluth

Proceedings Volume 7274, 72740C (2009) https://doi.org/10.1117/12.814305

KEYWORDS: Diffraction, Printing, Source mask optimization, Optical lithography, Resolution enhancement technologies, Photomasks, Semiconducting wafers, Lithographic illumination, Lithography, Manufacturing

Read Abstract +

Proceedings Article | 16 March 2009 Paper

Paper

Improving yield through the application of process window OPC

James Oberschmidt, Ioana Graur, Kenneth Settlemyer, Shahab Siddiqui, Azalia Krasnoperova, Ian Stobert, Jaione Tirapu Azpiroz

Proceedings Volume 7274, 727411 (2009) https://doi.org/10.1117/12.811868

KEYWORDS: Optical proximity correction, Semiconducting wafers, Photomasks, Tolerancing, Lithography, Photoresist processing, Algorithm development, Critical dimension metrology, Yield improvement, Computer simulations

Read Abstract +

Proceedings Article | 16 March 2009 Paper

Paper

Overcoming the challenges of 22-nm node patterning through litho-design co-optimization

L. Zhuang, J. C. Arnold, J. Chang, A. Krasnoperova, Z. Baum, C. S. Koay, G. Han, Y. Zou, K. Petrillo, S. Kanakasabapathy, E. McLellan, S. Burns, V. Dai, S. Holmes, C. Tabery, S. Mansfield, J. Chen, R. H. Kim, S. Halle, Y. Ma, J. Cho, Y. Deng, J. Kye, A. Klatchko, V. Paruchuri, D. Horak, C. Spence, M. Colburn, Y. Yin, Martin Burkhardt, S. Schmitz

Proceedings Volume 7274, 727404 (2009) https://doi.org/10.1117/12.814433

KEYWORDS: Etching, Lithography, Printing, Optical lithography, Double patterning technology, Resolution enhancement technologies, Logic, Metals, Photomasks, Tolerancing

Read Abstract +

Proceedings Article | 21 March 2006 Paper

Paper

Integration of the retical systematic CD errors into an OPC modeling and correction

Azalia Krasnoperova, Scott Mansfield, Geng Han

Proceedings Volume 6154, 61543I (2006) https://doi.org/10.1117/12.657194

KEYWORDS: Optical proximity correction, Data modeling, Photomasks, Critical dimension metrology, Calibration, Process modeling, Semiconducting wafers, Model-based design, Reticles, Control systems

Read Abstract +

Proceedings Article | 20 March 2006 Paper

Paper

Process window OPC for reduced process variability and enhanced yield

Azalia Krasnoperova, Mohamed Al-Imam, Scott Mansfield, Ioana Graur, Hesham Maaty, James Culp

Proceedings Volume 6154, 61543L (2006) https://doi.org/10.1117/12.656835

KEYWORDS: Optical proximity correction, Process modeling, Lithography, Critical dimension metrology, Detection and tracking algorithms, Metals, Manufacturing, Resolution enhancement technologies, Photomasks, Yield improvement

Read Abstract +

Proceedings Article | 14 September 2001 Paper

Paper

100-nm gate lithography for double-gate transistors

John Treichler, Jung Yoon, Azalia Krasnoperova, Paul Solomon, Kathryn Guarini, Ying Zhang, Inna Babich

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435793

KEYWORDS: Photomasks, Lithography, Photoresist materials, Field effect transistors, Phase shifts, Oxides, Transistors, Chemical mechanical planarization, Semiconducting wafers, Deep ultraviolet

Read Abstract +

Proceedings Article | 25 June 1999 Paper

Paper

Imaging capabilities of proximity x-ray lithography at 70-nm ground rules

Shalom Wind, Azalia Krasnoperova, Robert Rippstein, Cameron Brooks, Alex Flamholz, Michael Lercel, Ernst Kratschmer

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351118

KEYWORDS: Photomasks, X-rays, Photoresist materials, Gold, Semiconducting wafers, Image quality, Lithography, Diffusion, X-ray imaging, X-ray lithography

Read Abstract +

Proceedings Article | 25 June 1999 Paper

Paper

X-ray mask defect repair optimization

Azalia Krasnoperova, Chet Wasik, Zheng Chen, Steven Nash

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351119

KEYWORDS: Photomasks, Opacity, X-rays, Printing, Gold, Bridges, X-ray lithography, Ion beams, Lithography, Ions

Read Abstract +

Proceedings Article | 6 November 1998 Paper

Paper

Advanced zone plate microfocusing optics

Jorg Maser, Franco Cerrina, Wenbing Yun, Yuli Vladimirsky, W. Rodrigues, Zhen Chen, Enzo Di Fabrizio, Zhonghou Cai, Azalia Krasnoperova, Barry Lai, Dan Legnini, Massimo Gentili

Proceedings Volume 3449, (1998) https://doi.org/10.1117/12.330340

KEYWORDS: Zone plates, X-rays, X-ray optics, Spatial resolution, Diffraction, Optics manufacturing, X-ray lithography, Grazing incidence, Manufacturing, Hard x-rays

Read Abstract +

Proceedings Article | 5 June 1998 Paper

Paper

ACLV control in x-ray lithography

Azalia Krasnoperova, Robert Rippstein, Denise Puisto, Janet Rocque

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309568

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, X-rays, X-ray lithography, Error analysis, Lithography, Control systems, Mirrors, Synchrotrons

Read Abstract +

Proceedings Article | 5 June 1998 Paper

Paper

X ray fills the gap

Sang Lee, Alan Thomas, Steve Loh, Alek Chen, Paul Agnello, Chet Wasik, Sue Chaloux, Alex Flamholz, Daniel DeMay, Jeffrey Leavey, Kenneth Giewont, G. Murphy, Azalia Krasnoperova

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309566

KEYWORDS: Photomasks, X-rays, Semiconducting wafers, Lithography, X-ray lithography, Etching, Photoresist processing, Logic, Capacitors, X-ray imaging

Read Abstract +

Proceedings Article | 7 July 1997 Paper

Paper

Comparative study of positive chemically amplified photoresist performance for x-ray and DUV lithography

Azalia Krasnoperova, Hiroshi Ito, Gregory Breyta, Debra Fenzel-Alexander

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275871

KEYWORDS: X-rays, Deep ultraviolet, X-ray lithography, Photoresist materials, Lithography, Photomasks, Photoresist developing, Polymers, FT-IR spectroscopy, Critical dimension metrology

Read Abstract +

Proceedings Article | 7 July 1997 Paper

Paper

Evaluation of the Defense Advanced Lithography Program (DALP) x-ray lithography aligner

J. Silverman, Alex Flamholz, Dave Heald, P. Kochersperger, R. Amodeo, V. Dimilia, Ben Vampatella, Carl Stahlhammer, George Gomba, Azalia Krasnoperova, William Chu, Robert Rippstein, Alek Chen, Robert Fair

Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275803

KEYWORDS: Semiconducting wafers, Photomasks, Optical alignment, X-rays, X-ray lithography, Lithography, Overlay metrology, Calibration, Error analysis, Sensors

Read Abstract +

Proceedings Article | 27 May 1996 Paper

Paper

New application for x-ray lithography: fabrication of blazed diffractive optical elements with a deep-phase profile

Alexander Poleshchuk, Voldemar Koronkevich, Zheng Chen, Azalia Krasnoperova, Oleg Makarov, Vadim Cherkashin, Franco Cerrina

Proceedings Volume 2723, (1996) https://doi.org/10.1117/12.240477

KEYWORDS: Photomasks, X-rays, X-ray lithography, Diffractive optical elements, Lenses, Diffraction, Modulation, Binary data, Polymethylmethacrylate, Computer generated holography

Read Abstract +

Proceedings Article | 25 September 1995 Paper

Paper

Microfocusing optics for hard xrays fabricated by x-ray lithography

Efim Gluskin, Enzo Di Fabrizio, Barry Lai, Wenbing Yun, Azalia Krasnoperova, Zheng Chen, Franco Cerrina, Massimo Gentili

Proceedings Volume 2516, (1995) https://doi.org/10.1117/12.221670

KEYWORDS: Gold, Photoresist materials, X-ray lithography, X-rays, Photomasks, Lithography, Polymethylmethacrylate, Electroplating, Optical fabrication, Zone plates

Read Abstract +

Proceedings Article | 19 May 1995 Paper

Paper

Effect of the high-contrast-mask sidewall slope on deep x-ray lithography

Yueqi Zhu, Azalia Krasnoperova, Franco Cerrina, Zheng Chen

Proceedings Volume 2437, (1995) https://doi.org/10.1117/12.209171

KEYWORDS: Photomasks, X-ray lithography, Polymethylmethacrylate, Gold, X-rays, Image processing, Photoresist processing, Image acquisition, Absorption, Micromachining

Read Abstract +

Proceedings Article | 13 May 1994 Paper

Paper

Spectral effects on x-ray lithography

Whitson Waldo, James Taylor, Cristiano Capasso, Azalia Krasnoperova, Franco Cerrina, Mumit Khan

Proceedings Volume 2194, (1994) https://doi.org/10.1117/12.175798

KEYWORDS: Photomasks, Aluminum, Photons, Mirrors, X-ray lithography, Optical filters, Electrons, Absorption, Magnesium, Beryllium

Read Abstract +

Proceedings Article | 13 May 1994 Paper

Paper

Modeling of a positive chemically amplified photoresist for x-ray lithography

Yueqi Zhu, Steven Rhyner, Whitson Waldo, Azalia Krasnoperova, Franco Cerrina, James Taylor

Proceedings Volume 2194, (1994) https://doi.org/10.1117/12.175805

KEYWORDS: Photoresist materials, Diffusion, X-rays, Photoresist developing, X-ray lithography, FT-IR spectroscopy, Photomasks, Absorption, Optical lithography, Polymers

Read Abstract +

Proceedings Article | 13 May 1994 Paper

Paper

X-ray lithography processing at CXrL from beamline to quarter-micron NMOS devices

John Wallace, Hsin Li, Gong Chen, Eti Ganin, James Taylor, Franco Cerrina, Ramez Nachman, Michael Reilly, Eric Brodsky, Paul Anderson, Stephen Campbell, Gregory Wells, Azalia Krasnoperova

Proceedings Volume 2194, (1994) https://doi.org/10.1117/12.175835

KEYWORDS: Photomasks, Semiconducting wafers, Optical alignment, X-rays, X-ray lithography, Mirrors, Coating, Beryllium, X-ray optics, Aluminum

Read Abstract +

Proceedings Article | 13 May 1994 Paper

Paper

Comparative study of x-ray lithography process optimization using theoretical and empirical tools

Whitson Waldo, Cristiano Capasso, Mumit Khan, Franco Cerrina, James Taylor, Azalia Krasnoperova

Proceedings Volume 2194, (1994) https://doi.org/10.1117/12.175833

KEYWORDS: Photomasks, X-ray lithography, Gold, Photoresist processing, Mirrors, Photoresist developing, Photoresist materials, Scanning electron microscopy, Image processing, Diffusion

Read Abstract +

Proceedings Article | 15 September 1993 Paper

Paper

Prebake and post-exposure bake effects on the dissolution of AZ-PF

Franco Cerrina, L. Ocola, S. Turner, Michael Reilly, Azalia Krasnoperova

Proceedings Volume 1925, (1993) https://doi.org/10.1117/12.154767

KEYWORDS: Semiconducting wafers, Chemically amplified resists, Polymers, Photoresist processing, Silver, Optical lithography, Silicon, Chlorine, X-ray lithography, Surface roughness

Read Abstract +

Proceedings Article | 15 September 1993 Paper

Paper

Track oriented chemically-amplified resist processes for quarter-micron lithography

Shaowie Pan, Azalia Krasnoperova, Michael Reilly, James Taylor, Quinn Leonard

Proceedings Volume 1925, (1993) https://doi.org/10.1117/12.154768

KEYWORDS: Photoresist processing, X-ray lithography, Lithography, Standards development, Photomasks, Data processing, Semiconducting wafers, Optimization (mathematics), Algorithm development, Diffusion

Read Abstract +

Showing 5 of 25 publications

SIGN IN TO:

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Advertisement

Advertisement