Dr. Azat M. Latypov
Technical Staff at Mentor Graphics Corporation, A Siemens Business
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Publications (18)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Calibration, Metals, Photoresist materials, Monte Carlo methods, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Stochastic processes, Edge roughness, Absorption

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Fluctuations and noise, Polymers, Annealing, Molecules, Thermal effects, Directed self assembly, Integrated circuits, Applied physics, Molecular self-assembly

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Calibration, Photoresist materials, Monte Carlo methods, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing, Stochastic processes, Edge roughness, EUV optics, Chemically amplified resists

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Diffractive optical elements, Diffusion, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness, Optimization (mathematics), Photoresist processing, Tolerancing, Stochastic processes, Edge roughness

SPIE Journal Paper | August 12, 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Atrial fibrillation, Optical proximity correction, Lithography, Deep ultraviolet, SRAF, Linear filtering, Etching, Printing, Semiconducting wafers, Directed self assembly

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Lithography, Optical lithography, Atrial fibrillation, Deep ultraviolet, Etching, Linear filtering, Directed self assembly, Optical proximity correction, SRAF, Semiconducting wafers

Showing 5 of 18 publications
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