Dr. Balint Meliorisz Profile

Dr. Balint Meliorisz

at Synopsys GmbH

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Author

Publications (10)

Proceedings Article | 30 March 2020 Presentation + Paper

EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity, and stochastic defectivity

Seiji Nagahara, Cong Que Dinh, Keisuke Yoshida, Gosuke Shiraishi, Yoshihiro Kondo, Kosuke Yoshihara, Kathleen Nafus, John Petersen, Danilo De Simone, Philippe Foubert, Geert Vandenberghe, Hans-Jürgen Stock, Balint Meliorisz

Proceedings Volume 11326, 113260A (2020) https://doi.org/10.1117/12.2552166

KEYWORDS: Stochastic processes, Ultraviolet radiation, Extreme ultraviolet lithography, Photoresist processing, Extreme ultraviolet, Optical lithography, Absorption

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Proceedings Article | 8 April 2019 Paper

PSCAR optimization to reduce EUV resist roughness with sensitization using Resist Formulation Optimizer (RFO)

Seiji Nagahara, Cong Que Dinh, Gosuke Shiraishi, Yuya Kamei, Kathleen Nafus, Yoshihiro Kondo, Michael Carcasi, Yukie Minekawa, Hiroyuki Ide, Yuichi Yoshida, Kosuke Yoshihara, Ryo Shimada, Masaru Tomono, Kazuhiro Takeshita, Serge Biesemans, Hideo Nakashima, Danilo De Simone, John Petersen, Philippe Foubert, Peter De Bisschop, Geert Vandenberghe, Hans-Jürgen Stock, Balint Meliorisz

Proceedings Volume 10960, 109600A (2019) https://doi.org/10.1117/12.2515187

KEYWORDS: Stochastic processes, Calibration, Extreme ultraviolet, Line edge roughness, 3D modeling, Extreme ultraviolet lithography, Switching

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Proceedings Article | 26 March 2019 Paper

Calibrated PSCAR stochastic simulation

Cong Que Dinh, Seiji Nagahara, Gousuke Shiraishi, Yukie Minekawa, Yuya Kamei, Michael Carcasi, Hiroyuki Ide, Yoshihiro Kondo, Yuichi Yoshida, Kosuke Yoshihara, Ryo Shimada, Masaru Tomono, Teruhiko Moriya, Kazuhiro Takeshita, Kathleen Nafus, Serge Biesemans, John Petersen, Danilo De Simone, Philippe Foubert, Peter De Bisschop, Geert Vandenberghe, Hans-Jürgen Stock, Balint Meliorisz

Proceedings Volume 10957, 109571O (2019) https://doi.org/10.1117/12.2515183

KEYWORDS: Modeling and simulation, Calibration, Ultraviolet radiation, Extreme ultraviolet lithography, Stochastic processes, Data modeling, Line width roughness, Extreme ultraviolet, Scanning electron microscopy

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Proceedings Article | 6 September 2018 Paper

Computational enablement for designs with sub-20nm metal tip to tip using cut shapes from grapho-epitaxy directed self-assembly

Balint Meliorisz, Kafai Lai, Ulrich Welling, Hans-Jürgen Stock, Sajan Marokkey, Thomas Muelders, Jing Sha, Chi-chun Liu, Cheng Chi, Jing Guo, Clifford Osborn, Jaime Morillo, Wolfgang Demmerle, Derren Dunn

Proceedings Volume 10586, 105860R (2018) https://doi.org/10.1117/12.2297344

KEYWORDS: Metals, Directed self assembly, Critical dimension metrology, Calibration, Error analysis, Etching, Computer simulations, Process modeling, Optical lithography, Extreme ultraviolet lithography

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Proceedings Article | 27 March 2018 Presentation + Paper

EUV resist sensitization and roughness improvement by PSCAR with in-line UV flood exposure system

Seiji Nagahara, Michael Carcasi, Gosuke Shiraishi, Yuya Kamei, Kathleen Nafus, Yukie Minekawa, Hiroyuki Ide, Yoshihiro Kondo, Takahiro Shiozawa, Keisuke Yoshida, Masashi Enomoto, Kosuke Yoshihara, Hideo Nakashima, Serge Biesemans, Ryo Shimada, Masaru Tomono, Kazuhiro Takeshita, Teruhiko Moriya, Hayakawa Makoto, Ryo Aizawa, Yoshitaka Konishi, Masafumi Hori, Ken Maruyama, Hisashi Nakagawa, Masayuki Miyake, Tomoki Nagai, Satoshi Dei, Takehiko Naruoka, Motoyuki Shima, Toru Kimura, Geert Vandenberghe, John Petersen, Danilo De Simone, Foubert Philippe, Hans-Jürgen Stock, Balint Meliorisz, Akihiro Oshima, Seiichi Tagawa

Proceedings Volume 10586, 1058606 (2018) https://doi.org/10.1117/12.2297498

KEYWORDS: Ultraviolet radiation, Floods, Picosecond phenomena, Extreme ultraviolet lithography, Calibration, Extreme ultraviolet, Chemically amplified resists, Polymers, Image enhancement, Absorption

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Proceedings Article | 27 April 2017 Presentation + Paper

Advanced fast 3D DSA model development and calibration for design technology co-optimization

Kafai Lai, Balint Meliorisz, Thomas Muelders, Ulrich Welling, Hans-Jürgen Stock, Sajan Marokkey, Wolfgang Demmerle, Chi-Chun Liu, Cheng Chi, Jing Guo

Proceedings Volume 10144, 101440H (2017) https://doi.org/10.1117/12.2260379

KEYWORDS: 3D modeling, Calibration, Data modeling, Optical lithography, Nanotechnology, Very large scale integration, System on a chip, Logic, Research facilities

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Proceedings Article | 22 March 2016 Paper

Modeling and parameter tuning for templated directed self-assembly

B. Meliorisz, T. Mülders, H.-J. Stock, S. Marokkey, W. Demmerle, K. Lai, A. Raghunathan, P. Dhagat

Proceedings Volume 9777, 97770Z (2016) https://doi.org/10.1117/12.2219158

KEYWORDS: Calibration, Data modeling, 3D modeling, Computational lithography, Lithography, Optimization (mathematics), Directed self assembly, Optical lithography, Metals, Photomasks, Scanning electron microscopy, Statistical analysis, Picosecond phenomena, Interfaces

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Proceedings Article | 21 September 2011 Paper

Simulation tools for advanced mask aligner lithography

Arianna Bramati, Uwe Vogler, Balint Meliorisz, Kristian Motzek, Michael Hornung, Reinhard Voelkel

Proceedings Volume 8167, 81670U (2011) https://doi.org/10.1117/12.897572

KEYWORDS: Photomasks, Lithography, Lithographic illumination, Optical proximity correction, Molybdenum, Semiconducting wafers, Optical lithography, Photoresist materials, Light sources, Integrated optics

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Proceedings Article | 19 May 2008 Paper

Increasing the predictability of AIMS measurements by coupling to resist simulations

Balint Meliorisz, Andreas Erdmann, Thomas Schnattinger, Ulrich Ströβner, Thomas Scherübl, Peter De Bisschop, Vicky Philipsen

Proceedings Volume 7028, 70282S (2008) https://doi.org/10.1117/12.793098

KEYWORDS: Semiconducting wafers, Photoresist materials, Data modeling, Photomasks, Scanners, Diffusion, Lithography, Photoresist processing, Calibration, Photoresist developing

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SPIE Journal Paper | 1 April 2007

Simulation of mask proximity printing

Balint Meliorisz, Andreas Erdmann

JM3, Vol. 6, Issue 02, 023006, (April 2007) https://doi.org/10.1117/12.10.1117/1.2727475

KEYWORDS: Diffraction, Photomasks, Printing, Photoresist materials, Lithography, Computer simulations, Refractive index, Waveguides, Wave propagation, Tolerancing

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Showing 5 of 10 publications

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