Dr. Banqiu Wu
Sr. Dir/Mask Clean at Applied Materials Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (15)

Proceedings Article | 9 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Etching, Photomasks, Line width roughness, Transistors, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing, Edge roughness, Plasma

SPIE Journal Paper | 22 March 2013
JM3 Vol. 12 Issue 02
KEYWORDS: Etching, Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Multilayers, Line width roughness, Inspection, Photoresist processing, Plasma, Silicon

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Multilayers, Etching, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Tantalum, Binary data, Ruthenium

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Particles, Chemistry, Inspection, Nondestructive evaluation, Chromium, Scanning electron microscopy, Latex, Photomasks, Mask cleaning, Liquids

Proceedings Article | 2 May 2008
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Lithography, Seaborgium, Deep ultraviolet, Air contamination, Crystals, Sulfur, Oxygen, Pellicles, Adsorption, Photomasks

Showing 5 of 15 publications
Conference Committee Involvement (10)
Photomask Technology
20 September 2020 | Monterey, California, United States
Photomask Technology
16 September 2019 | Monterey, California, United States
Photomask Technology
17 September 2018 | Monterey, California, United States
Photomask Technology
11 September 2017 | Monterey, California, United States
Photomask Technology
12 September 2016 | San Jose, California, United States
Showing 5 of 10 Conference Committees
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