Dr. Barney M. Cohen
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Sensors, Temperature metrology, Time metrology, Photoresist processing, Process control, Data modeling, Thermal modeling, Infrared sensors

Proceedings Article | 2 June 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Semiconducting wafers, Temperature metrology, Sensors, Electronics, Silicon, Deep ultraviolet, Platinum, Time metrology, Calibration, Resistance

Proceedings Article | 16 July 2002
Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI
KEYWORDS: Semiconducting wafers, Sensors, Temperature metrology, Deep ultraviolet, Convection, Silicon, Calibration, Critical dimension metrology, Platinum, Wafer testing

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