Barry Saville
at KLA New York
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Analytics, Data modeling, Modulation, Inspection, Optical inspection, Machine learning, Semiconducting wafers, Yield improvement, Defect inspection

SPIE Journal Paper | 5 September 2018
JM3 Vol. 18 Issue 01
KEYWORDS: Inspection, Semiconducting wafers, Stochastic processes, Extreme ultraviolet, Etching, Defect detection, Electron beam lithography, Modulation, Coating, Extreme ultraviolet lithography

Proceedings Article | 28 March 2018 Presentation + Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Electron beam lithography, Defect detection, Modulation, Etching, Coating, Inspection, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Stochastic processes

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Reticles, Contamination, Defect detection, Crystals, Inspection, Scanning electron microscopy, Printing, Semiconducting wafers, Crystallography, Defect inspection

Proceedings Article | 5 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Signal to noise ratio, Lithography, Etching, Coating, Inspection, Wafer inspection, Photomasks, Semiconducting wafers, Wafer testing, Defect inspection

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top