Dr. Bart Laenens
SPIE Involvement:
Publications (14)

Proceedings Article | 28 April 2017 Presentation
Thomas Wallow, Chen Zhang, Anita Fumar-Pici, Jun Chen, Bart Laenens, Christopher Spence, David Rio, Paul van Adrichem, Harm Dillen, Jing Wang, Peng-Cheng Yang, Werner Gillijns, Patrick Jaenen, Frieda van Roey, Jeroen van de Kerkhove, Sergey Babin
Proceedings Volume 10145, 101451Q (2017) https://doi.org/10.1117/12.2260443
KEYWORDS: Metrology, Optical proximity correction, Data modeling, Optical lithography, Signal to noise ratio, OLE for process control, Instrument modeling, Image analysis, Calibration, Metals

Proceedings Article | 25 March 2016 Paper
Proceedings Volume 9778, 97780W (2016) https://doi.org/10.1117/12.2221894
KEYWORDS: Metrology, Scanning electron microscopy, Semiconducting wafers, Critical dimension metrology, Optical proximity correction, Logic, Image processing, Process control, Electron microscopes, Tolerancing, Distance measurement, Lithography, Finite element methods, Calibration

Proceedings Article | 18 March 2016 Paper
Proceedings Volume 9776, 97761S (2016) https://doi.org/10.1117/12.2220025
KEYWORDS: Neodymium, Photomasks, Semiconducting wafers, Extreme ultraviolet, Image processing, Lithography, Lithographic illumination, Extreme ultraviolet lithography, Optical proximity correction, Atrial fibrillation, Reticles, Printing, Deep ultraviolet

Proceedings Article | 28 March 2014 Paper
Sander Wuister, Tamara Druzhinina, Davide Ambesi, Bart Laenens, Linda He Yi, Jo Finders
Proceedings Volume 9049, 90491O (2014) https://doi.org/10.1117/12.2048065
KEYWORDS: Extreme ultraviolet, Neodymium, Lithography, Neck, Polymethylmethacrylate, Optical lithography, Polymers, Scanning electron microscopy, Error analysis, Directed self assembly

Proceedings Article | 14 October 2011 Paper
Kazuya Iwase, Peter De Bisschop, Bart Laenens, Zhipan Li, Keith Gronlund, Paul van Adrichem, Stephen Hsu
Proceedings Volume 8166, 81662A (2011) https://doi.org/10.1117/12.898749
KEYWORDS: SRAF, Photomasks, Logic, Source mask optimization, Critical dimension metrology, Double patterning technology, Resolution enhancement technologies, Molybdenum, Surface plasmons, Model-based design

Showing 5 of 14 publications
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