Dr. Bart Laenens
at ASML San Jose
SPIE Involvement:
Author
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Publications (14)

PROCEEDINGS ARTICLE | April 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Signal to noise ratio, Metrology, Optical lithography, Data modeling, Calibration, Metals, Image analysis, Optical proximity correction, OLE for process control, Instrument modeling

PROCEEDINGS ARTICLE | March 25, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Metrology, Logic, Calibration, Image processing, Electron microscopes, Scanning electron microscopy, Distance measurement, Process control, Finite element methods, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Tolerancing

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Lithography, Reticles, Atrial fibrillation, Lithographic illumination, Deep ultraviolet, Image processing, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Neodymium, Semiconducting wafers

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Neck, Lithography, Optical lithography, Polymethylmethacrylate, Polymers, Error analysis, Scanning electron microscopy, Extreme ultraviolet, Directed self assembly, Neodymium

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Surface plasmons, Logic, Photomasks, Double patterning technology, Source mask optimization, SRAF, Critical dimension metrology, Molybdenum, Model-based design, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Reticles, Optical lithography, Diffractive optical elements, Cadmium, Scanners, Manufacturing, Photomasks, Critical dimension metrology, Semiconducting wafers, Fiber optic illuminators

Showing 5 of 14 publications
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