Dr. Bart Rijpers
Applications Engineer at ASML Netherlands BV
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 20 March 2018 Paper
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Diffraction, Wavefront aberrations, Optical aberrations, Overlay metrology

Proceedings Article | 24 March 2009 Paper
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Argon, Coating, Fourier transforms, Scanning electron microscopy, Transmission electron microscopy, Photoresist materials, Scatterometry, 3D metrology, Semiconducting wafers, Scanning transmission electron microscopy

Proceedings Article | 16 April 2008 Paper
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Metrology, Statistical analysis, Calibration, Etching, Scanning electron microscopy, Scatterometry, Process control, Critical dimension metrology, Semiconducting wafers, Multiphoton fluorescence microscopy

Proceedings Article | 24 March 2006 Paper
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Cadmium, Etching, Electron microscopes, Atomic force microscopy, Scanning electron microscopy, Line width roughness, Critical dimension metrology, Line edge roughness, Scanning transmission electron microscopy, Edge roughness

Proceedings Article | 24 March 2006 Paper
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Ions, Silicon, Coating, Scanning electron microscopy, Ion beams, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Gallium, Scanning transmission electron microscopy

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