Dr. Bartholomaeus Szafranek
at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 26 September 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Semiconductors, Multilayers, Scanners, Manufacturing, Image analysis, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Back end of line

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