Dr. Bartholomaeus Szafranek
at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 6 October 2020 Presentation + Paper
Proc. SPIE. 11518, Photomask Technology 2020
KEYWORDS: Semiconductors, Lithography, Electron beams, Deep ultraviolet, Manufacturing, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology

Proceedings Article | 26 September 2019 Presentation + Paper
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Semiconductors, Multilayers, Scanners, Manufacturing, Image analysis, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Back end of line

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top