Dr. Bartosz Bilski
Student at Institut für Technische Optik
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 14 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Mirrors, Imaging systems, Scanners, Computing systems, Photomasks, Extreme ultraviolet, Transistors, Extreme ultraviolet lithography, Fiber optic illuminators

Proceedings Article | 28 September 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference
KEYWORDS: Semiconductors, Diffraction, Lithographic illumination, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Image contrast enhancement, Semiconducting wafers, Overlay metrology

SPIE Journal Paper | 17 May 2017
JM3 Vol. 16 Issue 02
KEYWORDS: Critical dimension metrology, Line edge roughness, Model-based design

Proceedings Article | 24 March 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Reticles, Scanners, Particles, Pellicles, Projection systems, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Fiber optic illuminators

Proceedings Article | 5 April 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Semiconductors, Einsteinium, Polarization, Manufacturing, Computer simulations, Scatterometry, Cadmium sulfide, Critical dimension metrology, Line edge roughness, Scatter measurement

Proceedings Article | 14 May 2010
Proc. SPIE. 7718, Optical Micro- and Nanometrology III
KEYWORDS: Semiconductors, Lithography, Diffraction, Refractive index, Metrology, 3D modeling, Scatterometry, Near field, Critical dimension metrology, Line edge roughness

Showing 5 of 7 publications
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