Dr. Bartosz Bilski
Imaging Performance and Applications Scientist at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 29 August 2019
Proc. SPIE. 11177, 35th European Mask and Lithography Conference (EMLC 2019)
KEYWORDS: Optical imaging, Lithography, Diffraction, Lithographic illumination, Scanners, Projection systems, Extreme ultraviolet, Extreme ultraviolet lithography, Computational lithography, Projection lithography, EUV optics

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Diffraction, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization

Proceedings Article | 28 September 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference
KEYWORDS: Semiconductors, Diffraction, Lithographic illumination, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Image contrast enhancement, Semiconducting wafers, Overlay metrology

SPIE Journal Paper | 17 May 2017
JM3 Vol. 16 Issue 02
KEYWORDS: Critical dimension metrology, Line edge roughness, Model-based design

Proceedings Article | 24 March 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Reticles, Scanners, Particles, Pellicles, Projection systems, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Fiber optic illuminators

Showing 5 of 8 publications
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