Dr. Bassam Shamoun
at Intel
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | October 15, 2003
Proc. SPIE. 5220, Nanofabrication Technologies
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Modulation, Laser applications, Photomasks, Raster graphics, Mask making, Semiconducting wafers, Prototyping

PROCEEDINGS ARTICLE | July 19, 2000
Proc. SPIE. 4066, Photomask and Next-Generation Lithography Mask Technology VII
KEYWORDS: Lithography, Electron beam lithography, Reticles, Control systems, Photomasks, Raster graphics, Critical dimension metrology, Line edge roughness, Binary data, RGB color model

PROCEEDINGS ARTICLE | July 5, 2000
Proc. SPIE. 4000, Optical Microlithography XIII
KEYWORDS: Superposition, Electron beam lithography, Optical lithography, Data modeling, Distortion, Computer simulations, Photomasks, Thermal modeling, Systems modeling, Astatine

PROCEEDINGS ARTICLE | December 30, 1999
Proc. SPIE. 3873, 19th Annual Symposium on Photomask Technology
KEYWORDS: Lithography, Electron beam lithography, Reticles, Control systems, Photomasks, Optical proximity correction, Raster graphics, Photoresist processing, Vestigial sideband modulation, RGB color model

PROCEEDINGS ARTICLE | December 18, 1998
Proc. SPIE. 3546, 18th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Thermography, Optical components, Reflectors, Electron beam lithography, Reticles, Magnesium fluoride, Kinematics, Finite element methods, Photomasks, Thermal modeling

PROCEEDINGS ARTICLE | June 5, 1998
Proc. SPIE. 3331, Emerging Lithographic Technologies II
KEYWORDS: Semiconductors, Electron beam lithography, Reticles, Distortion, 3D modeling, Monte Carlo methods, Photomasks, Acquisition tracking and pointing, Thermal modeling, Tin

Showing 5 of 7 publications
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