Dr. Bassam Shamoun
Engineering Principal at Intel Corp
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 24 February 2021 Presentation + Paper
Proc. SPIE. 11610, Novel Patterning Technologies 2021
KEYWORDS: Roads, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Data conversion, Wafer manufacturing

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
KEYWORDS: Lithography, Optical lithography, Electrodes, Manufacturing, Printing, Photomasks, Extreme ultraviolet, Raster graphics, Overlay metrology, Vestigial sideband modulation

Proceedings Article | 15 October 2003 Paper
Proc. SPIE. 5220, Nanofabrication Technologies
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Modulation, Laser applications, Photomasks, Raster graphics, Mask making, Semiconducting wafers, Prototyping

Proceedings Article | 19 July 2000 Paper
Proc. SPIE. 4066, Photomask and Next-Generation Lithography Mask Technology VII
KEYWORDS: Lithography, Electron beam lithography, Reticles, Control systems, Photomasks, Raster graphics, Critical dimension metrology, Line edge roughness, Binary data, RGB color model

Proceedings Article | 5 July 2000 Paper
Proc. SPIE. 4000, Optical Microlithography XIII
KEYWORDS: Superposition, Electron beam lithography, Optical lithography, Data modeling, Distortion, Computer simulations, Photomasks, Thermal modeling, Systems modeling, Astatine

Showing 5 of 9 publications
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