Prof. Bei Yu
Assistant Professor at Chinese Univ of Hong Kong
SPIE Involvement:
Author
Publications (18)

SPIE Journal Paper | August 24, 2017
JM3 Vol. 16 Issue 03
KEYWORDS: Lithography, Neural networks, Convolution, Neurons, Machine learning, Photomasks, Performance modeling, Feature extraction, Convolutional neural networks, Sensors

SPIE Journal Paper | June 14, 2017
JM3 Vol. 16 Issue 02
KEYWORDS: Electron beam lithography, Extreme ultraviolet lithography, Computer programming, Lithography, Metals, Semiconductors, Directed self assembly, Manufacturing, Photomasks

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Convolutional neural networks, Data modeling, Sensors, Feature extraction, Neural networks, Design for manufacturing, Very large scale integration, Photomasks, Machine learning, Convolution, Neurons

SPIE Journal Paper | October 21, 2016
JM3 Vol. 15 Issue 04
KEYWORDS: Source mask optimization, Optical proximity correction, Data modeling, Lithography, Feature extraction, Principal component analysis, Model-based design, Performance modeling, Photomasks, Manufacturing

PROCEEDINGS ARTICLE | March 16, 2016
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Semiconductors, Lithography, Metals, Manufacturing, Directed self assembly, Silicon carbide, New and emerging technologies

SPIE Journal Paper | March 11, 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Optical proximity correction, Data modeling, Model-based design, Performance modeling, Statistical modeling, Simulation of CCA and DLA aggregates, Lithography, Feature extraction, Monte Carlo methods, Optics manufacturing

Showing 5 of 18 publications
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