Ben S. Routley
at Univ of Newcastle
SPIE Involvement:
Author
Publications (2)

SPIE Journal Paper | September 8, 2017
JM3 Vol. 16 Issue 03
KEYWORDS: Photoresist materials, Maskless lithography, Lithography, Convolution, Optimization (mathematics), Photoresist developing, Process modeling, Matrices, Model-based design, Optical simulations

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Lithography, Optical lithography, Coating, Computer simulations, 3D modeling, Photoresist materials, Near field scanning optical microscopy, Aluminum, Near field optics, Absorption

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