Dr. Bencherki Mebarki
at Applied Materials Inc
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Optical lithography, Etching, Metals, Scanners, Copper, Double patterning technology, Optical alignment, Neodymium, Chemical mechanical planarization, Back end of line

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Oxides, Optical lithography, Etching, Dry etching, Dielectrics, Photomasks, Immersion lithography, Critical dimension metrology, Tin, Back end of line

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Oxides, Lithography, Optical lithography, Etching, Silicon, Photomasks, Extreme ultraviolet lithography, Double patterning technology, Immersion lithography, 193nm lithography

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