Dr. Benedicte P. Mortini
at STMicroelectronics
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Lithography, Optical lithography, Annealing, Chromium, Atomic force microscopy, Oxygen, Microlens, Photomasks, Photoresist processing, Grayscale lithography

Proceedings Article | 30 March 2010 Paper
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Calibration, Image processing, Diffusion, Atomic force microscopy, Photoresist materials, Microlens, Photomasks, Spherical lenses, Photoresist processing, Grayscale lithography

Proceedings Article | 15 April 2008 Paper
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Ellipsometry, FT-IR spectroscopy, Etching, Argon, Polymers, Resistance, Photoresist materials, Photoresist processing, Plasma treatment, Plasma

Proceedings Article | 16 May 2007 Paper
Proc. SPIE. 6591, Nanotechnology III
KEYWORDS: Thin films, Lithography, Polymethylmethacrylate, Polymers, Glasses, Silicon, Silicon films, Microelectronics, Polymer thin films, Temperature metrology

Proceedings Article | 3 May 2007 Paper
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Lithography, FT-IR spectroscopy, Contamination, Quartz, Polymers, Spectroscopy, Chemical analysis, Helium, Photoresist processing, Semiconducting wafers

Showing 5 of 17 publications
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