Benjamin L. Alles
at Advanced Mask Technology Ctr
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 19 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Monochromatic aberrations, Apodization, Polarization, Birefringence, Pellicles, Photomasks, Optical proximity correction, Sodium, Dielectric polarization

Proceedings Article | 15 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Etching, Numerical simulations, Image registration, Thermal effects, Photomasks, Semiconducting wafers, Data analysis

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