Mr. Benjamin D. Bunday
Senior Member Technical Staff at GLOBALFOUNDRIES Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (92)

PROCEEDINGS ARTICLE | March 22, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Fin field effect transistors, X-rays, Silicon, Image resolution, Scanning electron microscopy, 3D metrology, Process control, Critical dimension metrology, Overlay metrology

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Scanning electron microscopy, Monte Carlo methods, Line width roughness, Semiconductor manufacturing, Critical dimension scanning electron microscopy, Line edge roughness, Optimization (mathematics), Semiconducting wafers, Line scan image sensors

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Edge detection, Metrology, Optical lithography, Calibration, Digital filtering, Inspection, Electron microscopes, Scanning electron microscopy, Monte Carlo methods, Gaussian filters, Process control, Image filtering, Line width roughness, Critical dimension metrology, Semiconducting wafers, Line scan image sensors

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Electron beam lithography, Metrology, Optical lithography, Image processing, Manufacturing, Inspection, Image resolution, Scanning electron microscopy, Process control, Dimensional metrology, Critical dimension metrology, Semiconducting wafers, Overlay metrology, Defect inspection

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Signal to noise ratio, Metrology, Logic, X-rays, Silicon, Inspection, Image resolution, Scanning electron microscopy, Signal processing, 3D metrology, High volume manufacturing, Critical dimension metrology, Overlay metrology, Fin field effect transitor, Nanowires

SPIE Journal Paper | February 8, 2017
JM3 Vol. 16 Issue 01
KEYWORDS: Scattering, Fin field effect transitor, Laser scattering, Silicon, X-rays, Sensors, X-ray sources, Synchrotrons, Semiconductors, Dimensional metrology

Showing 5 of 92 publications
Conference Committee Involvement (10)
Metrology, Inspection, and Process Control for Microlithography XXXIII
24 February 2019 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXII
26 February 2018 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXI
27 February 2017 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXX
22 February 2016 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXIX
23 February 2015 | San Jose, California, United States
Showing 5 of 10 published special sections
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