Benjamin D. Bunday
President at AMAG Consulting, LLC
SPIE Involvement:
Conference Program Committee | Author
Publications (94)

Proceedings Article | 20 March 2020
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Image analysis, Scanning electron microscopy, Monte Carlo methods, Image quality, Stochastic processes

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Diffractive optical elements, Computer simulations, Image analysis, Scanning electron microscopy, Monte Carlo methods, Image filtering, Optical simulations, Line edge roughness, Edge roughness

Proceedings Article | 22 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Fin field effect transistors, X-rays, Silicon, Image resolution, Scanning electron microscopy, 3D metrology, Process control, Critical dimension metrology, Overlay metrology

Proceedings Article | 19 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Scanning electron microscopy, Monte Carlo methods, Line width roughness, Semiconductor manufacturing, Critical dimension scanning electron microscopy, Line edge roughness, Optimization (mathematics), Semiconducting wafers, Line scan image sensors

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Signal to noise ratio, Metrology, Logic, X-rays, Silicon, Inspection, Image resolution, Scanning electron microscopy, Signal processing, 3D metrology, High volume manufacturing, Critical dimension metrology, Overlay metrology, Nanowires

Showing 5 of 94 publications
Conference Committee Involvement (12)
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
21 February 2021 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXIV
24 February 2020 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXIII
25 February 2019 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXII
26 February 2018 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXI
27 February 2017 | San Jose, California, United States
Showing 5 of 12 Conference Committees
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