Dr. Benjamin L. Clark Profile

Dr. Benjamin L. Clark

at Inpria Corp

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 22 February 2021 Poster + Paper

Optimization of point-of-use filtration for metal oxide photoresist

Aiwen Wu, Harvey Tang, Gregg Conner, Shu Hao Chang, Gaetano Giordano, Dominick Smiddy, Mark Geniza, Benjamin Clark

Proceedings Volume 11612, 116120X (2021) https://doi.org/10.1117/12.2583842

KEYWORDS: Oxides, Metals, Extreme ultraviolet, Photoresist materials, Semiconducting wafers, Extreme ultraviolet lithography, Particles, Manufacturing, Chemically amplified resists

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Proceedings Article | 22 February 2021 Presentation

Advances in defect performance in metal oxide photoresists for EUV lithography

Stephen Meyers, Jan Doise, Michael Kocsis, Shu-Hao Chang, Benjamin Clark, Peter De Schepper, Jason Stowers, Alan Telecky, Andrew Grenville, Amrit Narasimhan, Danilo De Simone, Geert Vandenberghe, Philippe Foubert, Poulomi Das, Christophe Beral, Yannick Feurprier, Tomoya Onitsuka

Proceedings Volume 11609, 116090K (2021) https://doi.org/10.1117/12.2584769

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Proceedings Article | 24 March 2020 Presentation

Delivering metal oxide photoresists for EUV: overcoming challenges to scaling (Conference Presentation)

Andrew Grenville, Benjamin Clark, Peter de Schepper, Michael Kocsis, Jason Stowers, Alan Telecky

Proceedings Volume 11326, 1132610 (2020) https://doi.org/10.1117/12.2552894

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Proceedings Article | 25 March 2016 Paper

Metal oxide EUV photoresist performance for N7 relevant patterns and processes

Jason Stowers, Jeremy Anderson, Brian Cardineau, Benjamin Clark, Peter De Schepper, Joseph Edson, Michael Greer, Kai Jiang, Michael Kocsis, Stephen Meyers, Alan Telecky, Andrew Grenville, Danilo De Simone, Werner Gillijns, Geert Vandenberghe

Proceedings Volume 9779, 977904 (2016) https://doi.org/10.1117/12.2219527

KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, Metals, Oxides, Optical lithography, Absorbance, Etching, Stochastic processes, Photons, Line width roughness, Photoresist processing, Chemical elements

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Proceedings Article | 18 March 2016 Paper

Demonstration of an N7 integrated fab process for metal oxide EUV photoresist

Danilo De Simone, Ming Mao, Michael Kocsis, Peter De Schepper, Frederic Lazzarino, Geert Vandenberghe, Jason Stowers, Stephen Meyers, Benjamin Clark, Andrew Grenville, Vinh Luong, Fumiko Yamashita, Doni Parnell

Proceedings Volume 9776, 97760B (2016) https://doi.org/10.1117/12.2220051

KEYWORDS: Metals, Photoresist materials, Etching, Extreme ultraviolet lithography, Optical lithography, Resistance, Back end of line, Photoresist processing, Lithography, System on a chip, Photomasks, Extreme ultraviolet, Semiconducting wafers

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Proceedings Article | 20 March 2015 Paper

Integrated fab process for metal oxide EUV photoresist

Andrew Grenville, Jeremy Anderson, Benjamin Clark, Peter De Schepper, Joseph Edson, Michael Greer, Kai Jiang, Michael Kocsis, Stephen Meyers, Jason Stowers, Alan Telecky, Danilo De Simone, Geert Vandenberghe

Proceedings Volume 9425, 94250S (2015) https://doi.org/10.1117/12.2086006

KEYWORDS: Metals, Etching, Photoresist materials, Oxides, Extreme ultraviolet lithography, Extreme ultraviolet, Absorbance, Line width roughness, System on a chip, Tin

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Proceedings Article | 20 March 2015 Paper

Coater/developer process integration of metal-oxide based photoresist

Benjamin Clark, Michael Kocsis, Michael Greer, Andrew Grenville, Takashi Saito, Lior Huli, Richard Farrell, David Hetzer, Shan Hu, Hiroie Matsumoto, Andrew Metz, Shinchiro Kawakami, Koichi Matsunaga, Masashi Enomoto, Jeffrey Lauerhaas, Anthony Ratkovich, David DeKraker

Proceedings Volume 9425, 94251A (2015) https://doi.org/10.1117/12.2085982

KEYWORDS: Photoresist materials, Metals, Etching, Semiconducting wafers, Contamination, Tin, Thin film coatings, Extreme ultraviolet lithography, Oxides, Photoresist developing

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Proceedings Article | 23 March 2012 Paper

Coat-develop track process for inorganic EUV resist

Masahiko Harumoto, Tadashi Miyagi, Koji Kaneyama, Akihiko Morita, Charles Pieczulewski, Masaya Asai, Benjamin Clark

Proceedings Volume 8322, 83222C (2012) https://doi.org/10.1117/12.916122

KEYWORDS: Extreme ultraviolet, Polymers, Photoresist processing, Semiconducting wafers, Photoresist materials, Coating, Thin film coatings, Lithography, Extreme ultraviolet lithography, Polymer thin films

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Proceedings Article | 7 April 2011 Paper

Directly patterned inorganic hardmask for EUV lithography

Jason Stowers, Alan Telecky, Michael Kocsis, Benjamin Clark, Douglas Keszler, Andrew Grenville, Chris Anderson, Patrick Naulleau

Proceedings Volume 7969, 796915 (2011) https://doi.org/10.1117/12.879542

KEYWORDS: Etching, Extreme ultraviolet lithography, Semiconducting wafers, Metals, Extreme ultraviolet, Oxides, Absorption, Coating, Photons, Photoresist processing

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Showing 5 of 9 publications

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