Dr. Benjamin L. Clark
at Inpria Corp
SPIE Involvement:
Publications (9)

Proceedings Article | 22 February 2021 Poster + Paper
Proceedings Volume 11612, 116120X (2021) https://doi.org/10.1117/12.2583842
KEYWORDS: Oxides, Metals, Extreme ultraviolet, Photoresist materials, Semiconducting wafers, Extreme ultraviolet lithography, Particles, Manufacturing, Chemically amplified resists

Proceedings Article | 22 February 2021 Presentation
Stephen Meyers, Jan Doise, Michael Kocsis, Shu-Hao Chang, Benjamin Clark, Peter De Schepper, Jason Stowers, Alan Telecky, Andrew Grenville, Amrit Narasimhan, Danilo De Simone, Geert Vandenberghe, Philippe Foubert, Poulomi Das, Christophe Beral, Yannick Feurprier, Tomoya Onitsuka
Proceedings Volume 11609, 116090K (2021) https://doi.org/10.1117/12.2584769

Proceedings Article | 24 March 2020 Presentation
Andrew Grenville, Benjamin Clark, Peter de Schepper, Michael Kocsis, Jason Stowers, Alan Telecky
Proceedings Volume 11326, 1132610 (2020) https://doi.org/10.1117/12.2552894

Proceedings Article | 25 March 2016 Paper
Jason Stowers, Jeremy Anderson, Brian Cardineau, Benjamin Clark, Peter De Schepper, Joseph Edson, Michael Greer, Kai Jiang, Michael Kocsis, Stephen Meyers, Alan Telecky, Andrew Grenville, Danilo De Simone, Werner Gillijns, Geert Vandenberghe
Proceedings Volume 9779, 977904 (2016) https://doi.org/10.1117/12.2219527
KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, Metals, Oxides, Optical lithography, Absorbance, Etching, Stochastic processes, Photons, Line width roughness, Photoresist processing, Chemical elements

Proceedings Article | 18 March 2016 Paper
Danilo De Simone, Ming Mao, Michael Kocsis, Peter De Schepper, Frederic Lazzarino, Geert Vandenberghe, Jason Stowers, Stephen Meyers, Benjamin Clark, Andrew Grenville, Vinh Luong, Fumiko Yamashita, Doni Parnell
Proceedings Volume 9776, 97760B (2016) https://doi.org/10.1117/12.2220051
KEYWORDS: Metals, Photoresist materials, Etching, Extreme ultraviolet lithography, Optical lithography, Resistance, Back end of line, Photoresist processing, Lithography, System on a chip, Photomasks, Extreme ultraviolet, Semiconducting wafers

Showing 5 of 9 publications
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top