Benjamin Duclaux
Senior Engineer at STMicroelectronics (Crolles II) SAS
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Author
Profile Summary

Senior Lithography Research and Development Engineer, working at STMicroelectronics in Crolles (France). Was assignee at Albany (NY) Nanotech center within IBM-GF-Samsung and STMicro alliance. Worked on Lithography process development from 40nm to 7nm logic nodes as well as imaging technology. Now focusing on Overlay and APC for advance fabs.
Publications (1)

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Overlay metrology, Optical alignment, Scanners, Process control, Data modeling, Reticles, Reliability, Optical lithography

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