Benjamin G. Eynon
Sr. Director, Marketing at Lam Res Corp.
SPIE Involvement:
Publications (26)

Proceedings Article | 20 October 2014 Paper
Shazad Paracha, Eliot Goodman, Benjamin Eynon, Ben Noyes, Steven Ha, Jong-Min Kim, Dong-Seok Lee, Dong-Heok Lee, Sang-Soo Cho, Young Ham, Anthony Vacca, Peter Fiekowsky, Daniel Fiekowsky
Proceedings Volume 9235, 92350Q (2014)
KEYWORDS: Inspection, Reticles, Semiconducting wafers, Photomasks, Bridges, Modulation, Lithography, Scanning electron microscopy, Classification systems, Polarization

Proceedings Article | 2 April 2014 Paper
Steven Thanh Ha, Benjamin Eynon, Melany Wynia, Jeff Schmidt, Christian Sparka, Antonio Mani, Roie Volkovich, SeungHoon Yoon, David Tien, John Robinson, Saroja Ramamurthi
Proceedings Volume 9050, 90502Y (2014)
KEYWORDS: Semiconducting wafers, Scanners, Scatterometry, Optical design, Scatter measurement, Finite element methods, Metrology, Semiconductors, Matrices, Lithography

Proceedings Article | 2 April 2014 Paper
Shazad Paracha, Benjamin Eynon, Ben Noyes, Anthony Nhiev, Anthony Vacca, Peter Fiekowsky, Dan Fiekowsky, Young Mog Ham, Doug Uzzel, Michael Green, Susan MacDonald, John Morgan
Proceedings Volume 9050, 905031 (2014)
KEYWORDS: Reticles, Semiconducting wafers, Inspection, Photomasks, Classification systems, Scanning electron microscopy, Critical dimension metrology, Error analysis, Wafer testing, Defect detection

Proceedings Article | 23 September 2013 Paper
Shazad Paracha, Samy Bekka, Benjamin Eynon, Jaehyuck Choi, Mehdi Balooch, Ivin Varghese, Tyler Hopkins
Proceedings Volume 8880, 88800M (2013)
KEYWORDS: Adhesives, Reticles, Inspection, Pellicles, Chromium, Semiconducting wafers, Silicon, Ions, Air contamination, Particles

Proceedings Article | 19 May 2008 Paper
Proceedings Volume 7028, 70280R (2008)
KEYWORDS: Semiconducting wafers, Line width roughness, Lithography, Etching, Photomasks, Critical dimension metrology, Beam shaping, Overlay metrology, Manufacturing, Line edge roughness

Showing 5 of 26 publications
Conference Committee Involvement (9)
Alternative Lithographic Technologies III
1 March 2011 | San Jose, California, United States
Alternative Lithographic Technologies II
23 February 2010 | San Jose, California, United States
Alternative Lithographic Technologies
24 February 2009 | San Jose, California, United States
Photomask Technology
18 September 2007 | Monterey, California, United States
Photomask Technology
19 September 2006 | Monterey, California, United States
Showing 5 of 9 Conference Committees
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