Benjamin G. Eynon
Sr. Director, R&D and Business Development at SUSS MicroTec
SPIE Involvement:
Senior status | Conference Program Committee | Author
Publications (26)

PROCEEDINGS ARTICLE | October 20, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Lithography, Reticles, Modulation, Polarization, Inspection, Scanning electron microscopy, Bridges, Photomasks, Semiconducting wafers, Classification systems

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Reticles, Defect detection, Error analysis, Inspection, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers, Wafer testing, Classification systems

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Semiconductors, Lithography, Optical design, Metrology, Matrices, Scanners, Scatterometry, Finite element methods, Semiconducting wafers, Scatter measurement

PROCEEDINGS ARTICLE | September 23, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Reticles, Air contamination, Particles, Ions, Silicon, Inspection, Chromium, Pellicles, Semiconducting wafers, Adhesives

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Etching, Manufacturing, Photomasks, Line width roughness, Beam shaping, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 20, 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Lithography, Electron beam lithography, Etching, Manufacturing, Photomasks, Line width roughness, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Overlay metrology

Showing 5 of 26 publications
Conference Committee Involvement (9)
Alternative Lithographic Technologies III
1 March 2011 | San Jose, California, United States
Alternative Lithographic Technologies II
23 February 2010 | San Jose, California, United States
Alternative Lithographic Technologies
24 February 2009 | San Jose, California, United States
Photomask Technology
18 September 2007 | Monterey, California, United States
Photomask Technology
19 September 2006 | Monterey, California, United States
Showing 5 of 9 published special sections
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