Dr. Benjamin Szu-Min Lin
Lithography Application at Cymer Southeast Asia Ltd
SPIE Involvement:
Conference Program Committee | Author
Publications (34)

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Logic, Optical lithography, Cadmium, Etching, Photoresist materials, Photomasks, Optical simulations, Double patterning technology, Critical dimension metrology

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Light sources, Reticles, Logic, Optical lithography, Laser applications, Control systems, Laser scanners, Logic devices, SRAF, Critical dimension metrology

Proceedings Article | 10 December 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Mirrors, Ions, Coating, Reflectivity, Control systems, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

Proceedings Article | 13 March 2009
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Lithography, Diffusion, Field programmable gate arrays, Lens design, Design for manufacturing, Transistors, Immersion lithography, Critical dimension metrology, Design for manufacturability

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Laser applications, Control systems, Photoresist materials, Signal processing, Laser stabilization, Gas lasers, Critical dimension metrology, Semiconducting wafers, Beam controllers

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Optical lithography, Etching, Scanners, Manufacturing, Line width roughness, Double patterning technology, Line edge roughness, Semiconducting wafers, 193nm lithography

Showing 5 of 34 publications
Conference Committee Involvement (3)
SPIE Lithography Asia - Korea
13 October 2010 | n/a, Republic of Korea
SPIE Lithography Asia - Taiwan
18 November 2009 | Taipei, Taiwan
SPIE Lithography Asia - Taiwan
4 November 2008 | Taipei, Taiwan
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