Dr. Benjamin D. Painter
R&D Engineer at Synopsys Inc
SPIE Involvement:
Author
Publications (17)

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Electron beams, Optical lithography, Data modeling, Scattering, Photons, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, High volume manufacturing, Semiconducting wafers

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Optical lithography, Etching, Metals, Dielectrics, Printing, Photomasks, Double patterning technology, Connectors, Semiconducting wafers

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Optical lithography, Etching, Metals, Dielectrics, Photoresist materials, Capacitance, Photomasks, Double patterning technology, Tolerancing

PROCEEDINGS ARTICLE | March 7, 2012
Proc. SPIE. 8327, Design for Manufacturability through Design-Process Integration VI
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Metals, Dielectrics, Photomasks, Cadmium sulfide, Double patterning technology, Immersion lithography

PROCEEDINGS ARTICLE | March 10, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Atrial fibrillation, Manufacturing, 3D modeling, Printing, Solids, Photomasks, Cadmium sulfide, Optical proximity correction, Critical dimension metrology, Model-based design

PROCEEDINGS ARTICLE | September 30, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Mathematical modeling, Lithography, Atrial fibrillation, Data modeling, Imaging systems, Manufacturing, Printing, Photomasks, Optical proximity correction, Optimization (mathematics)

Showing 5 of 17 publications
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