Dr. Benjamin D. Painter
R&D Engineer at Synopsys Inc
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 24 March 2017 Paper
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Extreme ultraviolet lithography, Data modeling, Photoresist materials, Lithography, Optical proximity correction, Optical lithography, High volume manufacturing, Photons, Extreme ultraviolet, Semiconducting wafers, Electron beams, Scattering

Proceedings Article | 12 April 2013 Paper
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Metals, Photomasks, Printing, Optical lithography, Dielectrics, Etching, Lithography, Double patterning technology, Semiconducting wafers, Connectors

Proceedings Article | 13 March 2012 Paper
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Metals, Photomasks, Dielectrics, Optical lithography, Etching, Double patterning technology, Lithography, Photoresist materials, Capacitance, Tolerancing

Proceedings Article | 7 March 2012 Paper
Proc. SPIE. 8327, Design for Manufacturability through Design-Process Integration VI
KEYWORDS: Optical lithography, Photomasks, Logic, Lithography, Double patterning technology, Etching, Immersion lithography, Cadmium sulfide, Metals, Dielectrics

Proceedings Article | 10 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Atrial fibrillation, Optical proximity correction, Photomasks, Model-based design, Cadmium sulfide, Critical dimension metrology, Manufacturing, Printing, 3D modeling, Solids

Showing 5 of 17 publications
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