Benjamin Z. Wu
at Honeywell Electronic Materials
SPIE Involvement:
Publications (5)

Proceedings Article | 18 March 2010 Paper
Simi George, Patrick Naulleau, Ahila Krishnamoorthy, Zeyu Wu, Edward Rutter, Joseph Kennedy, Song Yuan Xie, Kyle Flanigan, Thomas Wallow
Proceedings Volume 7636, 763605 (2010)
KEYWORDS: Line edge roughness, Interfaces, Thin films, Photoresist materials, Extreme ultraviolet lithography, Extreme ultraviolet, 3D image processing, Photoresist processing, Head-mounted displays, Liquids

Proceedings Article | 11 December 2009 Paper
Proceedings Volume 7520, 75200O (2009)
KEYWORDS: Ultraviolet radiation, Photoresist materials, Optical lithography, Semiconducting wafers, Silicon, Double patterning technology, Optical properties, Lithography, Photoresist developing, Chemistry

Proceedings Article | 1 April 2009 Paper
Ze-Yu Wu, Joseph Kennedy, Song-Yuan Xie, Ron Katsanes, Kyle Flanigan, Junyan Dai, Nikolaos Bekiaris, Hiram Cervera, Glen Mori, Thomas Wallow
Proceedings Volume 7273, 72731I (2009)
KEYWORDS: Ultraviolet radiation, Photoresist materials, Optical lithography, Semiconducting wafers, Double patterning technology, Silicon, Optical properties, FT-IR spectroscopy, Lithography, Time division multiplexing

Proceedings Article | 4 December 2008 Paper
Joseph Kennedy, Song-Yuan Xie, Ze-Yu Wu, Ron Katsanes, Kyle Flanigan, Kevin Lee, Mark Slezak, Nicolette Fender, Junichi Takahashi
Proceedings Volume 7140, 71402S (2008)
KEYWORDS: Etching, Plasma etching, Photoresist materials, Optical lithography, Plasma, Silicon, Lithography, Optical properties, Polymers, Scanning electron microscopy

Proceedings Article | 4 April 2008 Paper
Proceedings Volume 6923, 69230W (2008)
KEYWORDS: Etching, Optical lithography, Plasma etching, Photoresist materials, Silicon, Plasma, Reflectivity, Chemistry, Photoresist processing, Wet etching

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