Benjamin Z. Wu
at Honeywell Electronic Materials
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 18, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Thin films, Interfaces, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Head-mounted displays, Line edge roughness, Photoresist processing, 3D image processing, Liquids

PROCEEDINGS ARTICLE | December 11, 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Optical lithography, Optical properties, Ultraviolet radiation, Silicon, Chemistry, Photoresist materials, Double patterning technology, Semiconducting wafers, Photoresist developing

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, FT-IR spectroscopy, Optical lithography, Optical properties, Ultraviolet radiation, Silicon, Photoresist materials, Double patterning technology, Time division multiplexing, Semiconducting wafers

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Optical lithography, Optical properties, Etching, Polymers, Silicon, Scanning electron microscopy, Photoresist materials, Plasma etching, Plasma

PROCEEDINGS ARTICLE | April 4, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Optical lithography, Etching, Silicon, Chemistry, Reflectivity, Photoresist materials, Wet etching, Plasma etching, Photoresist processing, Plasma

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