Mr. Beom-Seok Seo
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Computer simulations, Bridges, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Tolerancing, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Electronics, Logic, Optical lithography, Parallel processing, Photomasks, Double patterning technology, Product engineering, Electronic design automation, 193nm lithography, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 11, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Metals, Silicon, Manufacturing, Photomasks, Double patterning technology, Optical proximity correction

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Optical lithography, Calibration, Etching, Metals, 3D modeling, Bridges, Design for manufacturing, Optical proximity correction, Optimization (mathematics), Process modeling

PROCEEDINGS ARTICLE | March 21, 2007
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Lithography, Logic, Diffusion, Manufacturing, Electroluminescence, Photomasks, Optical proximity correction, Critical dimension metrology, Resolution enhancement technologies, Design for manufacturability

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