Dr. Bernard J. Roman
Consultant at SUNY Poly SEMATECH
SPIE Involvement:
Conference Program Committee | Author
Publications (25)

PROCEEDINGS ARTICLE | March 21, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Polarization, Etching, Manufacturing, Chromium, Photomasks, Plasma etching, Chlorine, Semiconducting wafers, Plasma

PROCEEDINGS ARTICLE | March 15, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Polarization, Etching, Manufacturing, Chromium, Photomasks, Plasma etching, Chlorine, Semiconducting wafers, Plasma

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Lithography, Reticles, Metrology, Optical lithography, Quartz, Image processing, Manufacturing, Inspection, Photomasks, Semiconducting wafers

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Reticles, Quartz, Image processing, Scanning electron microscopy, Photomasks, Optical proximity correction, Mask making, Binary data, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Semiconductors, Lithography, Reticles, Manufacturing, Scanning electron microscopy, Photomasks, Semiconducting wafers, Binary data, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Reticles, Quartz, Image processing, Manufacturing, Scanning electron microscopy, Photomasks, Optical proximity correction, Mask making, Resolution enhancement technologies, Phase shifts

Showing 5 of 25 publications
Conference Committee Involvement (3)
Optical Microlithography XVIII
1 March 2005 | San Jose, California, United States
Optical Microlithography XVII
24 February 2004 | Santa Clara, California, United States
Optical Microlithography XVI
25 February 2003 | Santa Clara, California, United States
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