Dr. Bernard J. Roman
Consultant at SUNY Poly SEMATECH
SPIE Involvement:
Conference Program Committee | Author
Publications (25)

Proceedings Article | 21 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Polarization, Etching, Manufacturing, Chromium, Photomasks, Plasma etching, Chlorine, Semiconducting wafers, Plasma

Proceedings Article | 15 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Polarization, Etching, Manufacturing, Chromium, Photomasks, Plasma etching, Chlorine, Semiconducting wafers, Plasma

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Semiconductors, Lithography, Image processing, Manufacturing, Image resolution, Photoresist materials, Image transmission, Photomasks, Nanoimprint lithography, 193nm lithography

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Reticles, Etching, Sputter deposition, Manufacturing, Chromium, Photomasks, Plasma etching, Semiconducting wafers, Phase shifts

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Semiconductors, Manufacturing, Chromium, Photoresist materials, Photomasks, Optical proximity correction, Mask making, Nanoimprint lithography, Resolution enhancement technologies, Phase shifts

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Reticles, Polarization, Monte Carlo methods, Near field, Photomasks, Critical dimension metrology, Tellurium, Binary data, Resolution enhancement technologies, Phase shifts

Showing 5 of 25 publications
Conference Committee Involvement (3)
Optical Microlithography XVIII
1 March 2005 | San Jose, California, United States
Optical Microlithography XVII
24 February 2004 | Santa Clara, California, United States
Optical Microlithography XVI
25 February 2003 | Santa Clara, California, United States
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