Dr. Bernd Bodermann
at Physikalisch Technische Bundesanstalt
SPIE Involvement:
Author | Editor
Publications (58)

SPIE Journal Paper | 5 May 2020
JM3 Vol. 19 Issue 02
KEYWORDS: Photomasks, Scatterometry, Lithography, Chaos, Inverse problems, Stochastic processes, Bayesian inference, Silicon, Error analysis, Oxides

Proceedings Article | 16 August 2019
Proc. SPIE. 11056, Optical Measurement Systems for Industrial Inspection XI

Proceedings Article | 22 July 2019
Proc. SPIE. 11076, Advances in Microscopic Imaging II
KEYWORDS: Optical filters, Light sources, Light emitting diodes, Sensors, Oxygen, Image sensors, Signal processing, Tissue optics, Signal detection, Oximetry

Proceedings Article | 22 July 2019
Proc. SPIE. 11057, Modeling Aspects in Optical Metrology VII
KEYWORDS: Ellipsometry, Statistical analysis, Polarization, Error analysis, Computer simulations, Optical testing, Inverse problems, Spectroscopic ellipsometry, Inverse optics, Maxwell's equations

Proceedings Article | 21 June 2019
Proc. SPIE. 11057, Modeling Aspects in Optical Metrology VII
KEYWORDS: Ellipsometry, Plasmonics, Nanostructures, Metrology, Numerical simulations, Scanning electron microscopy, Near field optics

Showing 5 of 58 publications
Proceedings Volume Editor (7)

SPIE Conference Volume | 22 August 2019

SPIE Conference Volume | 27 July 2017

SPIE Conference Volume | 21 June 2015

SPIE Conference Volume | 13 May 2013

SPIE Conference Volume | 23 May 2011

Showing 5 of 7 publications
Conference Committee Involvement (9)
Modeling Aspects in Optical Metrology VII
24 June 2019 | Munich, Germany
Modeling Aspects in Optical Metrology
26 June 2017 | Munich, Germany
Modeling Aspects in Optical Metrology V
23 June 2015 | Munich, Germany
Instrumentation, Metrology, and Standards for Nanomanufacturing VIII
20 August 2014 | San Diego, California, United States
Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VII
28 August 2013 | San Diego, California, United States
Showing 5 of 9 Conference Committees
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