Bernd Geh
SPIE Involvement:
Author | Science Fair Judge
Publications (31)

Proceedings Article | 30 November 2020 Presentation + Paper
T. Allenet, J. Santaclara, G. Rispens, B. Geh, Y. Ekinci
Proceedings Volume 11517, 115170J (2020)
KEYWORDS: Extreme ultraviolet lithography, Line width roughness, Scanners, Photoresist materials, Photoresist developing, Industrial chemicals, Image processing, Chemical analysis, Lithography, Diffraction gratings

Proceedings Article | 14 April 2020 Presentation + Paper
Proceedings Volume 11323, 113231A (2020)
KEYWORDS: Line width roughness, Photoresist materials, Photons, Scanners, Lithography, Line edge roughness, Convolution, Extreme ultraviolet lithography, Extreme ultraviolet, Stochastic processes

Proceedings Article | 18 October 2019 Open Access Paper
Proceedings Volume 10957, 1095705 (2019)
KEYWORDS: Extreme ultraviolet lithography, Optical lithography, Extreme ultraviolet, Photomasks, Source mask optimization, Printing, Scanners, Lithographic lenses, Metrology, Image resolution

Proceedings Article | 20 March 2018 Paper
Thomas Thamm, Bernd Geh, Marija Djordjevic Kaufmann, Rolf Seltmann, Alla Bitensky, Martin Sczyrba, Aravind Narayana Samy
Proceedings Volume 10587, 105870F (2018)
KEYWORDS: Photomasks, Scanners, Reticles, Light scattering, Scattering, Logic devices, Source mask optimization, Lithography

SPIE Journal Paper | 29 March 2016
Young Seog Kang, Cedric Affentauschegg, Jan Mulkens, Jang-Sun Kim, Ju Hee Shin, Young Ha Kim, YoungSun Nam, Young-Sin Choi, Hunhwan Ha, Dong-Han Lee, Jae-il Lee, Umar Rizvi, Bernd Geh, Rob van der Heijden, Jan Baselmans, Oh-Sung Kwon
JM3, Vol. 15, Issue 02, 021403, (March 2016)
KEYWORDS: Overlay metrology, Metrology, Distortion, Control systems, Semiconducting wafers, Scanners, Etching, Information technology, Image processing, Photomasks

Showing 5 of 31 publications
Conference Committee Involvement (12)
Optical Lithography XXXIV
22 February 2021 | Online Only, California, United States
Optical Microlithography XXXIII
25 February 2020 | San Jose, California, United States
Optical Microlithography XXXII
26 February 2019 | San Jose, California, United States
Optical Microlithography XXXI
27 February 2018 | San Jose, California, United States
Optical Microlithography XXX
28 February 2017 | San Jose, California, United States
Showing 5 of 12 Conference Committees
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