Bernd Geh
at Carl Zeiss SMT Inc
SPIE Involvement:
Fellow status | Senior status | Conference Program Committee | Author
Publications (28)

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Reticles, Scattering, Scanners, Light scattering, Photomasks, Logic devices, Source mask optimization

SPIE Journal Paper | 29 March 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Overlay metrology, Metrology, Distortion, Control systems, Semiconducting wafers, Scanners, Etching, Information technology, Image processing, Photomasks

Proceedings Article | 18 March 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Metrology, Data modeling, Calibration, Etching, Image processing, Distortion, Measurement devices, Photomasks, Overlay metrology, Instrument modeling

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Wafer-level optics, Metrology, Optical lithography, Diffractive optical elements, Cadmium, Databases, Scanners, Critical dimension metrology, Semiconducting wafers, Optics manufacturing

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Diffraction, Reticles, Reflectivity, Image quality, Projection systems, Photomasks, Extreme ultraviolet, Semiconducting wafers, Binary data, Image quality standards

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Diffraction, Reticles, Reflectivity, Image quality, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Semiconducting wafers

Showing 5 of 28 publications
Conference Committee Involvement (11)
Optical Microlithography XXXIII
23 February 2020 | San Jose, California, United States
Optical Microlithography XXXII
26 February 2019 | San Jose, California, United States
Optical Microlithography XXXI
27 February 2018 | San Jose, California, United States
Optical Microlithography XXX
28 February 2017 | San Jose, California, United States
Optical Microlithography XXIX
23 February 2016 | San Jose, California, United States
Showing 5 of 11 published special sections
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top