Bernd Geh
at Carl Zeiss SMT Inc
SPIE Involvement:
Conference Program Committee | Author | Science Fair Judge
Publications (30)

Proceedings Article | 14 April 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Scanners, Photons, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Convolution, Line edge roughness, Stochastic processes

Proceedings Article | 18 October 2019 Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Metrology, Optical lithography, Scanners, Image resolution, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Lithographic lenses

Proceedings Article | 20 March 2018 Paper
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Reticles, Scattering, Scanners, Light scattering, Photomasks, Logic devices, Source mask optimization

SPIE Journal Paper | 29 March 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Overlay metrology, Metrology, Distortion, Control systems, Semiconducting wafers, Scanners, Etching, Information technology, Image processing, Photomasks

Proceedings Article | 18 March 2015 Paper
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Metrology, Data modeling, Calibration, Etching, Image processing, Distortion, Measurement devices, Photomasks, Overlay metrology, Instrument modeling

Showing 5 of 30 publications
Conference Committee Involvement (12)
Optical Lithography XXXIV
21 February 2021 | San Jose, California, United States
Optical Microlithography XXXIII
25 February 2020 | San Jose, California, United States
Optical Microlithography XXXII
26 February 2019 | San Jose, California, United States
Optical Microlithography XXXI
27 February 2018 | San Jose, California, United States
Optical Microlithography XXX
28 February 2017 | San Jose, California, United States
Showing 5 of 12 Conference Committees
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