CONFERENCE PROCEEDINGS
Advanced Search
Bernd Leibold
at Institut für Mikroelektronik Stuttgart
SPIE Involvement:
Author
Publications (5)
Proceedings Article | 20 August 2004 Paper
Alternating aperture phase shift mask process using e-beam lithography for the second level
Corinna Koepernik, Joerg Butschke, Dirk Beyer, Mathias Irmscher, Bernd Leibold, Emmanuel Rausa, Rainer Plontke, Jason Plumhoff, Peter Voehringer
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557719
KEYWORDS: Overlay metrology, Photomasks, Etching, Electron beam lithography, Quartz, Scanning electron microscopy, Phase shifts, Lithography, Thin film coatings, Microsystems
Proceedings Article | 2 June 2004 Paper
Avoidance/reduction of charging effects in case of partially insufficient substrate conductivity when using ESPACER 300Z
Rainer Plontke, Lutz Bettin, Dirk Beyer, Joerg Butschke, Mathias Irmscher, Corinna Koepernik, Bernd Leibold, Armelle Vix, Peter Voehringer
Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568033
KEYWORDS: Quartz, Chromium, Thin film coatings, Electron beam lithography, Photomasks, Distortion, Optical inspection, Overlay metrology, Metrology, Resistance
Proceedings Article | 17 December 2003 Paper
Second-level imaging of advanced alternating phase-shift masks using e-beam lithography
Bernd Leibold, Joerg Butschke, Lutz Bettin, Dirk Beyer, Mathias Irmscher, Corinna Koepernik, Rainer Plontke, Armelle Vix, Peter Voehringer
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518037
KEYWORDS: Quartz, Electron beam lithography, Photomasks, Distortion, Thin film coatings, Overlay metrology, Etching, Phase shifts, Coating, Chemically amplified resists
Proceedings Article | 27 December 2002 Paper
Mask patterning using chemically amplified resists and the novel STEAG HamaTech Blank Coater ASR5000
Corinna Koepernik, Dirk Beyer, Peter Dress, Thomas Hoffmann, Peter Hudek, Mathias Irmscher, Christian Krauss, Bernd Leibold, Dietmar Mueller, Christian Reuter, Reinhard Springer, Jakob Szekeresch, Peter Voehringer
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467424
KEYWORDS: Coating, Photoresist processing, Mask making, Chemically amplified resists, Photomasks, Electron beam lithography, Capillaries, Binary data, Critical dimension metrology, Etching
Proceedings Article | 1 August 2002 Paper
Comparative evaluation of e-beam sensitive chemically amplified resists for mask making
Mathias Irmscher, Dirk Beyer, Joerg Butschke, Chris Constantine, Thomas Hoffmann, Corinna Koepernik, Christian Krauss, Bernd Leibold, Florian Letzkus, Dietmar Mueller, Reinhard Springer, Peter Voehringer
Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476944
KEYWORDS: Photomasks, Semiconducting wafers, Mask making, Line edge roughness, Etching, Silicon, Coating, Chemically amplified resists, Photoresist processing, Chromium
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top