Bernd Schulz
Senior Member of Technical Staff at GLOBALFOUNDRIES Dresden Module One, GmbH & Co. KG
SPIE Involvement:
Author
Publications (19)

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Diffraction, Data modeling, Manufacturing, Computer simulations, Scatterometry, Critical dimension metrology, Semiconducting wafers, Overlay metrology, Diffraction gratings

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Optical lithography, Metals, Computer simulations, Feature extraction, Distance measurement, Critical dimension metrology, Semiconducting wafers, Overlay metrology, Electrical breakdown

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Optical filters, Metrology, Data modeling, Optical properties, Etching, Image segmentation, Signal processing, Optical simulations, Semiconducting wafers, Overlay metrology

Proceedings Article | 17 October 2014
Proc. SPIE. 9231, 30th European Mask and Lithography Conference
KEYWORDS: Lithography, Metrology, Etching, Control systems, Distortion, Photomasks, Plasma etching, Semiconductor manufacturing, Semiconducting wafers, Overlay metrology

Proceedings Article | 1 October 2013
Proc. SPIE. 8886, 29th European Mask and Lithography Conference
KEYWORDS: Lithography, Metrology, Scanners, Manufacturing, Time metrology, Pollution control, Process control, Photomasks, Semiconducting wafers, Overlay metrology

Showing 5 of 19 publications
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