Dr. Berta A. Dinu
Senior System Engineer at KLA-Tencor Israel
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Metrology, Scanners, Distortion, Image registration, Pellicles, Distance measurement, Photomasks, Double patterning technology, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 23, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Diffraction, Metrology, Calibration, Scanners, Spectroscopy, Polarizers, Double patterning technology, Semiconducting wafers, Overlay metrology, Diffraction gratings

PROCEEDINGS ARTICLE | April 16, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Lithography, Optical design, Metrology, Sensors, Spectroscopy, Scatterometry, Signal processing, Semiconducting wafers, Wafer testing, Overlay metrology

PROCEEDINGS ARTICLE | June 18, 2007
Proc. SPIE. 6616, Optical Measurement Systems for Industrial Inspection V
KEYWORDS: Metrology, Detection and tracking algorithms, Silicon, Computer simulations, Scatterometry, Semiconducting wafers, Electromagnetism, Overlay metrology, Standards development, Algorithms

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Calibration, Scanners, Diagnostics, Control systems, Scanning electron microscopy, Finite element methods, Critical dimension metrology, Semiconducting wafers, Statistical modeling, Temperature metrology

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Metrology, Nano opto mechanical systems, Data modeling, Scanners, Scanning electron microscopy, Finite element methods, Critical dimension metrology, Semiconducting wafers, Overlay metrology, Standards development

Showing 5 of 9 publications
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