Dr. Bertrand Le-Gratiet
Technical Staff Fellow at STMicroelectronics SA
SPIE Involvement:
Publications (53)

Proceedings Article | 5 October 2023 Paper
Proceedings Volume 12802, 1280209 (2023) https://doi.org/10.1117/12.2675586
KEYWORDS: Semiconducting wafers, Distortion, Scanning electron microscopy, Metrology, Image processing, Contour extraction, Optical lithography, Lithography, Data modeling, Critical dimension metrology

Proceedings Article | 5 October 2023 Paper
F. Dettoni, B. Le-Gratiet
Proceedings Volume 12802, 128020P (2023) https://doi.org/10.1117/12.2675906
KEYWORDS: Metrology, Image processing, Semiconducting wafers, Overlay metrology, Databases, Image quality, Critical dimension metrology, Advanced process control, Automation, Data storage

Proceedings Article | 5 October 2023 Paper
Nicolas Kubler, Bertrand Le Gratiet, Florent Dettoni
Proceedings Volume 12802, 128020K (2023) https://doi.org/10.1117/12.2675924
KEYWORDS: Image sharpness, Image quality, Image processing, Metrology, Semiconductors, Scanning electron microscopy, Integrated circuits, Manufacturing, Industry, Critical dimension metrology

Proceedings Article | 27 April 2023 Presentation + Paper
Thibaut Bourguignon, Bertrand Le Gratiet, Jonathan Pradelles, Sébastien Bérard-Bergery, Charles Valade, Nivea Schuch, Nicolas Possémé
Proceedings Volume 12496, 124960J (2023) https://doi.org/10.1117/12.2657914
KEYWORDS: Scanning electron microscopy, Overlay metrology, Data modeling, Optical testing, Metrology, Contour extraction, Lithography, Design and modelling

SPIE Journal Paper | 6 December 2022 Open Access
Bertrand Le-Gratiet, Serap Savari
JM3, Vol. 21, Issue 04, 041601, (December 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.4.041601
KEYWORDS: Manufacturing, Analytics, Optical proximity correction, Deep learning, Optical lithography, Inspection, Semiconducting wafers, Metrology, Lithography, Industry

Showing 5 of 53 publications
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