Dr. Bertrand Le-Gratiet
Senior member of technical staff patterning at STMicroelectronics SA
SPIE Involvement:
Author
Publications (34)

PROCEEDINGS ARTICLE | September 19, 2018
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Lithography, Metrology, Convolutional neural networks, Data modeling, Imaging systems, Image processing, Microlens, Neural networks, Image classification, Semiconducting wafers

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, CMOS sensors, Metrology, Image processing, Quantum efficiency, Photodiodes, Scanning electron microscopy, Microlens, Neural networks

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Reticles, Optical lithography, Data modeling, Scanners, Reliability, Process control, Optical alignment, Overlay metrology

PROCEEDINGS ARTICLE | September 28, 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference
KEYWORDS: Lithography, Metrology, Etching, Inspection, Scanning electron microscopy, Data processing, Process control

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Electron beam lithography, Metrology, Optical lithography, Scanners, Inspection, Scanning electron microscopy, Finite element methods, Computational lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Metrology, Etching, Metals, Image processing, Copper, Manufacturing, Inspection, Scanning electron microscopy, Process control, Optical alignment, Semiconducting wafers, Process engineering, Chemical mechanical planarization

Showing 5 of 34 publications
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