Beverly H. Cheung
Applications Engineer at Nanometrics Inc
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Wafer-level optics, Lithography, Reticles, Metrology, Scanners, Reflectivity, Photoresist materials, Reflectometry, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Wafer-level optics, Semiconductors, Etching, Silicon, Photoresist materials, Process control, Finite element methods, Dysprosium, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Optical microscopes, Spatial frequencies, Scanners, Light scattering, Computer simulations, Scatterometry, Modulation transfer functions, Critical dimension metrology, Semiconducting wafers

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