Bhardwaj S. Durvasula
SPIE Involvement:
Area of Expertise:
Mask Data Preparation , Mask Process Correction , Computational Geometry
Profile Summary

I have an experience of over 10 years in the MDP (Mask Data Preparation) and MPC (Mask Process Correction) domains, primarily spent solving vast amounts of computational geometry and large data handling problems. I am currently working on the Calibre engine in Mentor. My ongoing research includes understanding the physics of lithography (because I need it), the statistical analysis of big data (because I use it), and machine learning (because every else is doing it).
Publications (15)

Proceedings Article | 21 November 2023 Presentation + Paper
Ingo Bork, Rachit Sharma, Malavika Sharma, Archana Rajagopalan, Bhardwaj Durvasula, Kushlendra Mishra, Mary Zuo
Proceedings Volume 12751, 127510Y (2023)
KEYWORDS: Modulation, Scattering, SRAF, Photomask technology, Backscatter, Photomasks, Manufacturing, Forward error correction, Extreme ultraviolet, Etching

Proceedings Article | 21 November 2023 Presentation + Paper
Apurva Bajpai, Rachit Sharma, Bhardwaj Durvasula, Ranganadh Peespati, Sayalee Gharat, Stephen Kim
Proceedings Volume 12751, 127510A (2023)
KEYWORDS: Process modeling, Photomasks, Optical lithography, Lithography, Data conversion, Extreme ultraviolet, Data processing, Contour modeling, Advanced patterning

Proceedings Article | 21 November 2023 Presentation + Paper
Bhardwaj Durvasula, Sayalee Gharat, Ranganadh Peesapati, Archana Rajagopalan, Rachit Sharma, Stephen Kim, Ingo Bork
Proceedings Volume 12751, 1275107 (2023)
KEYWORDS: Optical proximity correction, Lithography, Algorithm development, Photomasks, Industry

Proceedings Article | 16 September 2022 Paper
Jin Choi, Soo Ryu, Sukho Lee, Minah Kim, Sanghee Lee, Peter Buck, Bhardwaj Durvasula, Sayalee Gharat, Vlad Liubich
Proceedings Volume 12325, 1232508 (2022)
KEYWORDS: Photomasks, Optical proximity correction, Extreme ultraviolet, Optical lithography, Mask making

SPIE Journal Paper | 1 November 2021 Open Access
Jin Choi, Soo Ryu, Sukho Lee, Minah Kim, JoonSoo Park, Peter Buck, Ingo Bork, Bhardwaj Durvasula, Sayalee Gharat, Nageswara Rao, Ravi Pai, Sandeep Koranne, Alexander Tritchkov
JM3, Vol. 20, Issue 04, 041403, (November 2021)
KEYWORDS: Photomasks, Tolerancing, Optical proximity correction, Semiconducting wafers, Manufacturing, Extreme ultraviolet, Vestigial sideband modulation, Extreme ultraviolet lithography, Scanning electron microscopy, Lithography

Showing 5 of 15 publications
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