Bhardwaj S. Durvasula
SPIE Involvement:
Author
Area of Expertise:
Mask Data Preparation , Mask Process Correction , Computational Geometry
Profile Summary

I have an experience of over 10 years in the MDP (Mask Data Preparation) and MPC (Mask Process Correction) domains, primarily spent solving vast amounts of computational geometry and large data handling problems. I am currently working on the Calibre engine in Mentor. My ongoing research includes understanding the physics of lithography (because I need it), the statistical analysis of big data (because I use it), and machine learning (because every else is doing it).
Publications (4)

Proceedings Article | 26 September 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Scattering, Calibration, Etching, Control systems, Photomasks, Semiconductor manufacturing, Critical dimension metrology, Photoresist processing, Model-based design, Process modeling

Proceedings Article | 12 November 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Cadmium, Data modeling, Calibration, Etching, Scanning electron microscopy, Photomasks, Double patterning technology, SRAF, Vestigial sideband modulation

Proceedings Article | 3 October 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Computing systems, Data processing, Distributed computing, Optical proximity correction, Data communications, Data storage servers

Proceedings Article | 3 October 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Visualization, Metals, Error analysis, Computer simulations, Image quality, Beam shaping, Optical proximity correction, Data corrections, Process modeling, Vestigial sideband modulation

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