Dr. Bhaskar Nagabhirava
at Lam Research Corp.
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 24 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Optical lithography, Etching, Interfaces, Photoresist materials, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Stochastic processes, Photoresist developing

Proceedings Article | 16 October 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Lithography, Optical lithography, Etching, Interfaces, Photoresist materials, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Stochastic processes, Photoresist developing

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