Dr. Bicher H. Haj Ibrahim
at Ecole Polytechnique
SPIE Involvement:
Author
Publications (5)


PROCEEDINGS ARTICLE | September 10, 2011
Proc. SPIE. 8160, Polarization Science and Remote Sensing V
KEYWORDS: Optical imaging, Metrology, Error analysis, Polarimetry, Process control, Objectives, Microelectronics, Photomasks, Semiconducting wafers, Overlay metrology

SPIE Journal Paper | July 1, 2011
JM3 Vol. 10 Issue 03
KEYWORDS: Overlay metrology, Polarimetry, Error analysis, Silicon, Semiconducting wafers, Metrology, Optical testing, Microscopes, Critical dimension metrology, Mueller matrices

PROCEEDINGS ARTICLE | April 20, 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Microscopes, Metrology, Error analysis, Silicon, Manufacturing, Polarimetry, Optical testing, Critical dimension metrology, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | October 5, 2005
Proc. SPIE. 5963, Advances in Optical Thin Films II
KEYWORDS: Gradient-index optics, Ellipsometry, Antireflective coatings, Glasses, Spectroscopy, Silicon, Process control, Antennas, Microwave radiation, Plasma

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