Bill Volk
Vice President / General Manager at Keysight Technologies Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (26)

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Target detection, Lithography, Defect detection, Sensors, Databases, Inspection, Photomasks, Optical proximity correction, Critical dimension metrology, Resolution enhancement technologies

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Reticles, Defect detection, Data modeling, Databases, Inspection, Scanning electron microscopy, Optical proximity correction, Semiconducting wafers, Process modeling

Proceedings Article | 9 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Defect detection, Data modeling, Calibration, Databases, Inspection, Scanning electron microscopy, Bridges, Optical proximity correction, Semiconducting wafers

Proceedings Article | 7 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Manufacturing, Inspection, Photomasks, Optical proximity correction, Semiconducting wafers, Model-based design, Resolution enhancement technologies, Defect inspection, Design for manufacturability

Proceedings Article | 5 May 2005
Proc. SPIE. 5756, Design and Process Integration for Microelectronic Manufacturing III
KEYWORDS: Lithography, Reticles, Defect detection, Calibration, Inspection, Scanning electron microscopy, Design for manufacturing, Optical proximity correction, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Reticles, Scattering, Inspection, Photomasks, Optical proximity correction, Semiconducting wafers, Model-based design, Resolution enhancement technologies, Defect inspection

Showing 5 of 26 publications
Conference Committee Involvement (2)
Photomask Technology
9 September 2003 | Monterey, California, United States
Photomask Technology
1 October 2002 | Monterey, CA, United States
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