Dr. Bjoern Sass
at Advanced Mask Technology Ctr
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 25 May 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Data modeling, Quartz, Air contamination, Ions, Nitrogen, Inspection, Scanning electron microscopy, Photomasks, Chemical analysis, Oxidation

Proceedings Article | 25 May 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Contamination, Quartz, Air contamination, Ultraviolet radiation, Crystals, Ions, Diffusion, Manufacturing, Distortion, Photomasks

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Sensors, Etching, Dry etching, Resistance, Process control, Photomasks, Plasma etching, Critical dimension metrology, Radio frequency circuits, Plasma

Proceedings Article | 2 May 2008
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Metrology, Statistical analysis, Data modeling, Etching, Manufacturing, Chromium, Data processing, Critical dimension metrology, Photoresist processing, Statistical modeling

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Metrology, Statistical analysis, Diffractive optical elements, Data modeling, Etching, Error analysis, Scanning electron microscopy, Critical dimension metrology, Statistical modeling, Process modeling

Showing 5 of 6 publications
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