Blandine Minghetti
Principal Apps Engineer at ASML Malta
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 24 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithium, Roads, Data modeling, Scanners, Optical alignment, Yield improvement, Overlay metrology

Proceedings Article | 24 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Near infrared, Sensors, Scanners, Aluminum, Optical alignment, Laser beam diagnostics

Proceedings Article | 21 April 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Reticles, Metrology, Data modeling, Deep ultraviolet, Metals, Scanners, Process control, Photomasks, Image enhancement, Semiconducting wafers, Overlay metrology

Proceedings Article | 4 April 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Metrology, Data modeling, Scanners, Manufacturing, Control systems, Process control, Semiconductor manufacturing, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 22 February 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Monochromatic aberrations, Reticles, Calibration, Photomasks, Source mask optimization, Critical dimension metrology, Semiconducting wafers, Overlay metrology, Device simulation

Showing 5 of 15 publications
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